2005
DOI: 10.1016/j.mee.2004.11.014
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Analysis on the effect of parallel current path on the quality factor of CMOS spiral inductors for 1–10 GHz

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Cited by 6 publications
(3 citation statements)
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“…Most notably, this has been achieved using designs such as multilayered, stacked inductors (MLSIs), see Figure 1, which increase the inductance value due to the mutual magnetic coupling [1], and multiple shunt inductors, which lower the resistance [2,3]. For those researchers concerned with cost, much of the focus is within analyzing the process with respect to the standard complementary metal oxide semiconductor (CMOS) technology, where the key factors in determining the cost are (1) feature size, (2) number and kinds of layers, and (3) chip area occupied [4]. Within this work, we focus on simplifying the fabrication of integrated inductors for the emerging area of power converter technology.…”
Section: Introductionmentioning
confidence: 99%
“…Most notably, this has been achieved using designs such as multilayered, stacked inductors (MLSIs), see Figure 1, which increase the inductance value due to the mutual magnetic coupling [1], and multiple shunt inductors, which lower the resistance [2,3]. For those researchers concerned with cost, much of the focus is within analyzing the process with respect to the standard complementary metal oxide semiconductor (CMOS) technology, where the key factors in determining the cost are (1) feature size, (2) number and kinds of layers, and (3) chip area occupied [4]. Within this work, we focus on simplifying the fabrication of integrated inductors for the emerging area of power converter technology.…”
Section: Introductionmentioning
confidence: 99%
“…In the recent years, a large amount of modeling, characterization, and design work has been done to study air-core spiral inductors on silicon technology for both radio-frequency integrated circuits (RFICs) and monolithic microwave integrated circuits (MMICs). In order to improve the quality (Q) factor of the spiral inductors, many researches focus on the multi-layer structure, such as series stacked structure increasing the inductance value due to the mutual magnetic coupling [2], and double or multiple shunt structure dropping the series resistance [3,4]. However, for the spiral inductors used in fully integrated DC-DC converter, the simply series or shunt connection multilayer structure fabricated in conventional CMOS silicon process is difficult to satisfy the desired Q value, current capability and the limited of the occupied area directly [5].…”
Section: Introductionmentioning
confidence: 99%
“…To reduce the series resistance, multi-layer metals are used to construct the spiral inductor in parallel, [32,33,34,35]. In [33] for instance, the top metal and the underneath metal are connected to form a thicker conductor by shorting both metals using a via array.…”
Section: Spiral Inductormentioning
confidence: 99%