Cubic GaN films on GaAs (001) substrates which show a low-temperature photoluminescence (PL) without the deep-level orange (2.0 to 2.1 eV) band were grown by metalorganic vapor phase epitaxy (MOVPE). The orange luminescence recovers its relative intensity at room temperature, though the dominance of band-edge free exciton is still significant. The surface morphology was much smoother and the inclusion of hexagonal phase was much reduced for the samples with the suppressed orange band. It is suggested that the role of the GaN buffer layer is very essential in the optimized growth for high optical quality films, providing a flat cubic structure template as well as avoiding thermal damage of GaAs surface at high temperatures.Introduction Cubic GaN offers another possibility of nitride semiconductors beyond its hexagonal counterparts now successfully in practical use as blue-green light emitting devices. In fact, the growth of cubic GaN films on GaAs substrates has been much improved to give better quality samples which show good photoluminescence properties [1 to 3] and stimulated emission with GaN/AlGaN double heterostructures [4,5]. However, there is still a significant magnitude of deep-level orange luminescence at around 2.0 to 2.1 eV, which is analogous to the yellow luminescence (% 2:2 eV) in hexagonal GaN films [6] and accompanies the sharp luminescence lines near the band edge at 3.27 eV at low temperature. Moreover, due to the metastable nature of cubic GaN, hexagonal-phase domains or stacking faults are commonly incorporated in cubic GaN films [7,8]. These features limit the whole film quality, inhibiting practical device applications of cubic GaN films. In the present study, high optical quality cubic GaN films on GaAs (001) substrates were obtained by metalorganic vapor phase epitaxy (MOVPE), showing photoluminescence without the orange luminescence at low temperature, and, at the same time, showing a significantly suppressed inclusion of the hexagonal phase.