Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target

Masetti, Enrico; Grilli, Maria Luisa; Dautzenberg, G.; Macrelli, Guglielmo; Adamik, M.

doi:10.1016/s0927-0248(98)00136-6

Cited by 24 publications

(36 citation statements)

References 12 publications

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“…Many searchers study about mechanical [1][2][3][4]; optical [5][6], electrical [4;7] or magnetical [4] properties. On the other hand, tungsten is a material well known for its particular characteristics : high hardness, high melting point, low coefficient of friction, resistance against oxidation and corrosion [1;8].…”

Section: Introductionmentioning

confidence: 99%

Structure and morphological study of nanometer W and W3O thin films

Maillé¹,

Sant²,

Paven-Thivet³

et al. 2003

Thin Solid Films

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In this paper, the structure of nanometer tungsten thin films has been correlated to their surface morphology. Films have been deposited by RF-sputtering at a working pressure of 0.5 Pa and with a power density of 1.18 W/cm 2 . Two phases with different morphology has been observed :W 3 O with a nanograins structure is present in the first step of the tungsten growth; and, when the thickness is increased, a pure tungsten Wolfram phase (W) with a lamellar structure appears. We demonstrate that W 3 O is related to a pollution of the target surface between two growth runs. We succeed to suppress this phase and to obtain pure tungsten Wolfram nanolayer, in order to realize [W/WO 3 ] n multilayer.

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Section: Introductionmentioning

confidence: 99%

Structure and morphological study of nanometer W and W3O thin films

Maillé¹,

Sant²,

Paven-Thivet³

et al. 2003

Thin Solid Films

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“…Interest in tungsten oxide nanoparticles dispersed in nanoporous silica stems from their photocatalytic [1][2][3] and optical applications [4][5][6][7][8].…”

Section: Introductionmentioning

confidence: 99%

“…Transition metal oxides are capable of withstanding glass consolidation temperatures and introducing addressable physical properties such as magnetism, variable absorbance and reflectance into the optical network [9]. Tungsten and molybdenum oxides and their corresponding mixed valence oxides, for example, have been examined as electroand photo-chromic materials for displays, smart windows, variable reflectance mirrors, and sensors [4][5][6][7][8].…”

Section: Introductionmentioning

confidence: 99%

“…UV photolysis of W(CO) 6 or Mo(CO) 6 physisorbed into PVG or structurally similar tetramethylorthosilicate/methanol/water (TMOS/MeOH/ H 2 O) xerogels also leads to metal oxides that photocatalyze the conversion of CO 2 to CH 4 [1][2][3]. Stoichiometric measurements, recovery of ≥98% of the coordinated CO, 13 C/ 12 C and H/D labeling, dependence on coabsorbed water, and the detection of 32-74% of the stoichiometrically expected O 2 establish that neither the zero valent tungsten or molybdenum photoproducts, nor the H 2 evolved from their oxidation by coadsorbed water are involved in the reduction of the CO 2 .…”

Section: Introductionmentioning

confidence: 99%

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Nature and distribution of tungsten oxides in porous Vycor glass

Gafney¹,

Zaitsev²,

Xu³

et al. 2015

Journal of Non-Crystalline Solids

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“…Several papers have described the present state of fabrication of such tungsten trioxide films for electrochromic applications [3]. Thin films of WO 3 were typically deposited by evaporation [4], sputtering [5], electrodeposition [6], and sol-gel method [3,7,8].…”

Section: Introductionmentioning

confidence: 99%

Investigation of electrochromic tungsten trioxide thin films prepared by the ILGAR method

Knittlmayer

Muffler

Fischer

et al. 2006

Ionics

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An ion layer gas reaction dip coating process for the deposition of tungsten trioxide has been developed. Thin films of electrochromic tungsten trioxide with thicknesses of up to 150 nm were prepared. The films were found to be microcrystalline by X-ray diffraction analysis. The growth rate of the films was measured by profilometry. The chemical diffusion coefficient of lithium was investigated as a function of the concentration of lithium by the electrochemical galvanostatic intermittent titration technique. The chemical diffusion coefficient e D was found to increase slightly from 7×10 −12 to 3×10 −1 cm 2 /s, with x increasing from 0.2 to 0.8 in Li x WO 3 .

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Analysis of the influence of the gas pressure during the deposition of electrochromic WO3 films by reactive r.f. sputtering of W and WO3 target

Cited by 24 publications

References 12 publications

Structure and morphological study of nanometer W and W3O thin films

Structure and morphological study of nanometer W and W3O thin films

Nature and distribution of tungsten oxides in porous Vycor glass

Investigation of electrochromic tungsten trioxide thin films prepared by the ILGAR method

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