Glow discharge AApp and HApp were prepared on silicon wafers and analyzed by XPS, AFM, ΔV (ζ‐measurements), XRR and NR. XRR and AFM measurements revealed smooth films of ≈30 nm thickness. XPS measurements in combination with XRR and NR allowed the film composition and mass densities (1.46 and 1.05 g · cm−3 for AApp and HApp respectively) to be calculated. The AApp film in contact with water was found to swell by ≈5%, contain ≈3% water and have ≈24% labile protons. The HApp film did not appear to swell, but contained ≈5% water, with ≈10% labile protons. The difference in the degree of proton exchange within the films and zeta potentials was attributed to the higher degree of residual amine functionality in the AA film.