2008
DOI: 10.1016/j.jcrysgro.2007.12.017
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Analysis of oxygen incorporation in unidirectionally solidified multicrystalline silicon for solar cells

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Cited by 56 publications
(27 citation statements)
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“…Coating material made of Si 3 N 4 exists between silicon melt and a quartz crucible in the case of the unidirectional solidification method, and it is not clear how oxygen is transferred from the crucible wall through the Si 3 N 4 coating. We concluded from results of Fourier transform infrared spectroscopy (FTIR) in our previous study that oxygen was dissolved from a crucible wall through the Si 3 N 4 coating by showing the existence of a boundary layer of oxygen near a crucible wall [6]. Oxygen was dissolved from a quartz crucible into silicon melt in the case of the Czochralski method.…”
Section: Introductionmentioning
confidence: 99%
“…Coating material made of Si 3 N 4 exists between silicon melt and a quartz crucible in the case of the unidirectional solidification method, and it is not clear how oxygen is transferred from the crucible wall through the Si 3 N 4 coating. We concluded from results of Fourier transform infrared spectroscopy (FTIR) in our previous study that oxygen was dissolved from a crucible wall through the Si 3 N 4 coating by showing the existence of a boundary layer of oxygen near a crucible wall [6]. Oxygen was dissolved from a quartz crucible into silicon melt in the case of the Czochralski method.…”
Section: Introductionmentioning
confidence: 99%
“…Many simulations of impurity transport have been reported. [11][12][13][14][15][16][17][18][19][20][21][22] Some of these previous investigations included only local simulations [11][12][13][14][15][16][17] that neglected the mass transport of the impurities in the gas phase. In other cases, the reported simulations included results of global simulations, [18][19][20][21] some of which only neglected mass transport of oxygen and carbon in the melt, 18) whereas others neglected carbon transfer for both the gas and the silicon melt.…”
Section: )mentioning
confidence: 99%
“…Contamination with light elements during the DS process is governed by the mass transport of impurities 22) similar in that of the CZ method. Carbon is one of the major impurities in multicrystalline silicon ingots, and it affects the density and electrical activity of dislocations.…”
Section: )mentioning
confidence: 99%
“…Similar to the Czochralski method, the unidirectional solidification is connected with transport of impurities. 1 Carbon and oxygen are two of the major impurities in multicrystalline silicon. If the carbon concentration exceeds 1 × 10 16 atom/cm 3 , it will markedly influence the precipitation of oxygen during thermal annealing of crystals and during device processing of the wafers cut from these crystals.…”
Section: Introductionmentioning
confidence: 99%