Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength

Lee, Seung Yoon; Hur, Sung Min; Kim, Hyung Joon; Lee, Dong Hoon; Lee, Young Tae; Kang, In Yong; Chung, Yong‐Chae; Yi, Moonsuk; Bok, Cheol Kyu; Ahn, Jinho

doi:10.1143/jjap.41.4086

Cited by 6 publications

(3 citation statements)

References 7 publications

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“…In our opinion, similar imperfections responsible for the enhancement of the surface undulation with increasing number of deposited layers were observed in Ref. 6.…”

Section: Resultssupporting

confidence: 86%

“…The multilayer mirrors have been extensively studied by various techniques in recent years 4–14. It has been shown that X‐ray reflectometry (XRR) can determine the resultant multilayer period, which is one of parameters determining the position of extreme‐ultraviolet peak 6. Atomic‐force microscopy (AFM) has been used to analyze the surface roughness before and after mirror deposition 4, 5.…”

Section: Introductionmentioning

confidence: 99%

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Study of roughness in multilayer Mo–Si mirrors

Valkovskiy

Байдакова

Brunkov

et al. 2011

Physica Status Solidi (a)

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Phone: þ7 812 292 7382, Fax: þ7 812 297 1017Combined approach based on X-ray reflectometry (XRR), atomic-force microscopy (AFM), and small-angle X-ray scattering (SAXS) has been applied to two series of multilayer Mo/Si mirrors grown by magnetron sputtering on standard and specially smoothed substrates under different technological conditions (A and B). Simulation of XRR data, using a model of two layers in period, can distinguish the mirror quality in terms of the total root mean square roughness. The quality is better for mirrors grown on smoother substrate, but it also depends on technological conditions. In addition, use of a model with transition layers reveals an asymmetry of Mo/Si and Si/Mo interfaces. Analysis of surface roughness PSD functions obtained by AFM shows that the surface diffusion is the dominant smoothing mechanism for all the mirrors studied. The low-frequency roughness is conformal to that of the substrate for better mirrors (series A), but increases for poorer quality mirrors (series B). Simulation of SAXS data provides roughness parameters of the internal interfaces. For the better mirrors, the lateral correlation length of the roughness does not exceed 13 nm. However, this length is about 50 nm for the poorer quality mirrors, in agreement with AFM data.

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“…In our opinion, similar imperfections responsible for the enhancement of the surface undulation with increasing number of deposited layers were observed in Ref. 6.…”

Section: Resultssupporting

confidence: 86%

Section: Introductionmentioning

confidence: 99%

Study of roughness in multilayer Mo–Si mirrors

Valkovskiy

Байдакова

Brunkov

et al. 2011

Physica Status Solidi (a)

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“…The base pressure of vacuum system is 2 × 10 −4 Pa, and the deposition is performed under Ar atmosphere of 0.1 Pa. The average deposition rates for Si and Mo were 0.32nm/s and 0.19nm/s, respectively, which were calculated from periodic Mo/Si multilayers with different average periodic thciknesses determined by X-ray reflectivity measurements 21 . In our scheme, the layer thickness is controlled by time and the time control precision is one second, thus the deposition rate means the control precision of the layer thickness.…”

Section: Precision Of Layer Thicknessmentioning

confidence: 99%

Design and fabrication of robust broadband extreme ultraviolet multilayers

et al. 2019

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The random layer thickness variations can induce a great deformation of the experimental reflection of broadband extreme ultraviolet multilayer. In order to reduce this influence of random layer thickness fluctuations, the multiobjective genetic algorithm has been improved and used in the robust design of multilayer with a broad angular bandpass. The robust multilayer with a lower sensitivity to random thickness errors have been obtained and the corresponding multilayer mirrors were fabricated.The experimental results of robust Mo/Si multilayer with a wide angular band were presented and analyzed, and the advantage of robust multilayer design was demonstrated.

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Mask Materials and Designs for Extreme Ultra Violet Lithography

Kim

Ahn

2018

Electron. Mater. Lett.

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Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength

Cited by 6 publications

References 7 publications

Study of roughness in multilayer Mo–Si mirrors

Study of roughness in multilayer Mo–Si mirrors

Design and fabrication of robust broadband extreme ultraviolet multilayers

Mask Materials and Designs for Extreme Ultra Violet Lithography

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