Analysis of multi-e-beam lithography for cutting layers at 7-nm node

Zhao, Lei; Wei, Yayi; Ye, Tianchun

doi:10.1117/1.jmm.15.4.043501

Cited by 4 publications

(2 citation statements)

References 18 publications

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“…However, a scanning strategy that more closely resembles raster scanning might provide interframe dependencies. Simple design rules 25 require a large fraction of the pixels in a typical mask layer to have pixel values of zero; i.e., the data are sparse. Figure 6 shows a pattern without correction in which 50% of the pixel values are zeros.…”

Section: Scanning Strategy and Compression Constraintsmentioning

confidence: 99%

Parallel compression/decompression-based datapath architecture for multibeam mask writers

2017

J. Micro/Nanolith. MEMS MOEMS

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Multibeam electron beam systems will be used in the future for mask writing and for complementary lithography. The major challenges of the multibeam systems are in meeting throughput requirements and in handling the large data volumes associated with writing grayscale data on the wafer. In terms of future communications and computational requirements, Amdahl's law suggests that a simple increase of computation power and parallelism may not be a sustainable solution. We propose a parallel data compression algorithm to exploit the sparsity of mask data and a grayscale video-like representation of data. To improve the communication and computational efficiency of these systems at the write time, we propose an alternate datapath architecture partly motivated by multibeam direct-write lithography and partly motivated by the circuit testing literature, where parallel decompression reduces clock cycles. We explain a deflection plate architecture inspired by NuFlare Technology's multibeam mask writing system and how our datapath architecture can be easily added to it to improve performance.

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Section: Scanning Strategy and Compression Constraintsmentioning

confidence: 99%

Parallel compression/decompression-based datapath architecture for multibeam mask writers

2017

J. Micro/Nanolith. MEMS MOEMS

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“…The emerging massively parallel electron beam direct write (MP-EBDW) is an attractive high resolution high throughput technology. MP-EBDW technology has the capability to address different applicationsprimarily CMOS driven [1][2][3][4] and significant manufacturing costs reduction [Fig. 1(a)].…”

Section: Introductionmentioning

confidence: 99%

Progress and process improvements for multiple electron-beam direct write

Servin

Pourteau

Pradelles

et al. 2017

Jpn. J. Appl. Phys.

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Massively parallel electron beam direct write (MP-EBDW) lithography is a cost-effective patterning solution, complementary to optical lithography, for a variety of applications ranging from 200 to 14 nm. This paper will present last process/integration results to achieve targets for both 28 and 45 nm nodes. For 28 nm node, we mainly focus on line-width roughness (LWR) mitigation by playing with stack, new resist platform and bias design strategy. The lines roughness was reduced by using thicker spin-on-carbon (SOC) hardmask (−14%) or non-chemically amplified (non-CAR) resist with bias writing strategy implementation (−20%). Etch transfer into trilayer has been demonstrated by preserving pattern fidelity and profiles for both CAR and non-CAR resists. For 45 nm node, we demonstrate the electron-beam process integration within optical CMOS flows. Resists based on KrF platform show a full compatibility with multiple stacks to fit with conventional optical flow used for critical layers. Electron-beam resist performances have been optimized to fit the specifications in terms of resolution, energy latitude, LWR and stack compatibility. The patterning process overview showing the latest achievements is mature enough to enable starting the multi-beam technology pre-production mode.

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Parallel compression/decompression-based datapath architecture for multibeam mask writers

Chaudhary

Savari

2017

33rd European Mask and Lithography Conference

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Analysis of multi-e-beam lithography for cutting layers at 7-nm node

Cited by 4 publications

References 18 publications

Parallel compression/decompression-based datapath architecture for multibeam mask writers

Parallel compression/decompression-based datapath architecture for multibeam mask writers

Progress and process improvements for multiple electron-beam direct write

Parallel compression/decompression-based datapath architecture for multibeam mask writers

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