2002
DOI: 10.1134/1.1469189
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Analysis and refinement of mathematical tools for modified time-of-flight method

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Cited by 3 publications
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“…In this case, the field will be concentrated in the gap of the double electric layer, i. e., inside the depletion layer. Moreover, the width of the depletion layer in amorphous silicon depends not only on the bias voltage but also on the concentration of deep and shallow traps of the donor and acceptor types [9]. The mathematical model describing all the mentioned contributions to the potential barrier would allow making quantitative estimations and form a clear view of both the reasons for the barrier height reduction and…”
mentioning
confidence: 99%
“…In this case, the field will be concentrated in the gap of the double electric layer, i. e., inside the depletion layer. Moreover, the width of the depletion layer in amorphous silicon depends not only on the bias voltage but also on the concentration of deep and shallow traps of the donor and acceptor types [9]. The mathematical model describing all the mentioned contributions to the potential barrier would allow making quantitative estimations and form a clear view of both the reasons for the barrier height reduction and…”
mentioning
confidence: 99%