2017
DOI: 10.1021/acsami.7b11191
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Analog Synaptic Behavior of a Silicon Nitride Memristor

Abstract: In this paper, we present a synapse function using analog resistive-switching behaviors in a SiN-based memristor with a complementary metal-oxide-semiconductor compatibility and expandability to three-dimensional crossbar array architecture. A progressive conductance change is attainable as a result of the gradual growth and dissolution of the conducting path, and the series resistance of the AlO layer in the Ni/SiN/AlO/TiN memristor device enhances analog switching performance by reducing current overshoot. A… Show more

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Cited by 205 publications
(135 citation statements)
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References 51 publications
(76 reference statements)
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“…g) Variable channel conductance of an ionotronic memristor. (f) Reproduced with permission . Copyright 2017, American Chemical Society.…”
Section: Ionotronic Memristorsmentioning
confidence: 99%
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“…g) Variable channel conductance of an ionotronic memristor. (f) Reproduced with permission . Copyright 2017, American Chemical Society.…”
Section: Ionotronic Memristorsmentioning
confidence: 99%
“…In the past few years, ionotronic transistors or memristors were proposed to mimic advanced neural functions. By connecting pressure sensors and oscilloscope with neuromorphic devices and adoping mathematical modeling and software simulation, advanced neural functions are simulated, including logic function, image memorization, pattern recognition, face recognition, classic conditioning, tactile‐perception system, etc. In this section, we shortly discuss these achievements.…”
Section: Advanced Neural Functions Based On Ionotronic Neuromorphic Dmentioning
confidence: 99%
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“…The switching time of such memristors is 100ns − 200ns, which is relatively fast comparing to HP T iO 2 memristors [46]. However, the switching voltage is large (greater than 5V [45]). In addition, the memristor has not been tested for HTM applications.…”
Section: Open Problemsmentioning
confidence: 99%
“…Several memristive devices are proven to be compatible with the CMOS fabrication process [137], [140]. While T iO 2−x memristors were quite popular, there are other growing list of memristors based on materials such as Hf O x , T aO x , M oO x , La 1x Sr x M nO 3 , InGaZnO [141], organic memristors with electrografted redox thin film [142], ferroelectric tunnel memristors (FTM), Ge 2 Sb 2 T e 5 (GST) memristors [132], SiO x [143], SiN x [141] and P r 0.7 Ca 0.3 M nO 3 (PCMO) [63]. As the memristor technology is only at early stages of development, the properties, stability issues, switching behavior and compatibility with CMOS devices of various memristive elements and selection of most stable material stack is an open problem.…”
Section: B Major Issues Open Problems and Future Work Prospectivementioning
confidence: 99%