“…Spatial variability, instead, is caused by the fabrication process of modern ICs: its effects manifest immediately after production and are fixed over time. In particular, spatial uncertainty effects can be divided into two categories: the ones causing a mismatch (intradie variations) between devices on the same die that are designed to be identical, and the interdie ones causing variations between devices separated by a long distance (from die to die) or that are manufactured at a different time (between wafer to wafer, or lot to lot) [26]. Typically, interdie variations cause a shift in the mean value of the chosen design parameters [26], while process-induced mismatch significantly threatens the efficiency of digital circuits, by influencing their timing closure [8], and analog ones, since matched devices and differential signal paths are fundamental for most high-performance analog circuits [27].…”