1983
DOI: 10.1063/1.332368
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An rf bridge technique for contactless measurement of the carrier lifetime in silicon wafers

Abstract: A contactless rf technique has been developed for measurement of the photoconductivity induced in silicon wafers by a flash of light from GaAs laser diodes. The carrier lifetime inferred from the photoconductivity decay correlates well with diffusion length measurements made on solar cells fabricated from the same wafers. The technique has been applied successfully to silicon whose resistivity is as low as 0.1 Ω cm and lifetime as short as 0.2 μs.

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Cited by 38 publications
(14 citation statements)
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“…6 Surface recombination velocity measurements were performed using a contactless rf conductivity apparatus. 5,[17][18][19][20] In this system, the output from a signal generator operating at 450 MHz was connected to a power splitter. One output from the power splitter was connected through an amplifier and a phase shifter to the local oscillator input of a doublebalanced frequency mixer, and the other output from the power splitter was connected through an amplifier to the coupled port of a directional coupler.…”
Section: ͓S0003-6951͑00͒01739-3͔mentioning
confidence: 99%
See 1 more Smart Citation
“…6 Surface recombination velocity measurements were performed using a contactless rf conductivity apparatus. 5,[17][18][19][20] In this system, the output from a signal generator operating at 450 MHz was connected to a power splitter. One output from the power splitter was connected through an amplifier and a phase shifter to the local oscillator input of a doublebalanced frequency mixer, and the other output from the power splitter was connected through an amplifier to the coupled port of a directional coupler.…”
Section: ͓S0003-6951͑00͒01739-3͔mentioning
confidence: 99%
“…16 Following the etch, no signals for elements other than silicon and ͑adventitious͒ carbonaceous material were observed in the wide scan of an x-ray photoelectron ͑XP͒ spectrum, and no oxide was detectable in the Si 2p region. The H-terminated Si samples were then chlorinated using PCl 5 in chlorobenzene, and were subsequently treated with either CH 3 MgBr ͑to obtain methylated surfaces͒ or with C 8 H 17 MgBr ͑to obtain octylated surfaces͒, as described previously. 6 The XP spectra of the chemically modified surfaces indicated the absence of oxidized Si, as well as increases in carbon levels for the longer chain alkane, consistent with prior XP measurements of such systems.…”
Section: ͓S0003-6951͑00͒01739-3͔mentioning
confidence: 99%
“…The MHz method (method (A)) drew attention in the 1980s as a transient method [9,10] but an enormous increase in the application of this method occurred after the development of the quasi-steady-state photoconductance (QSSPC) technique [11]. The close cooperation between the manufacturer of QSSPC equipment (Sinton Consulting) and users has lead to a number of very important applications of this technique.…”
Section: Detection Of Excess Charge Carriersmentioning
confidence: 99%
“…The excess of minority carriers in the volume relates directly to photoconductance. Usually, this magnitude is measured by indirect techniques: by measuring the reflectivity of a microwave signal, 9 or the resonance of an inductive 2 or capacitive circuit 10 where the sample is part of the resonant circuit.…”
Section: Techniques For the Estimation Of The Lifetime And The Recombmentioning
confidence: 99%