An overview of ion beam lithography for nanofabrication

Tandon, U. S.

doi:10.1016/0042-207x(92)90270-7

Cited by 22 publications

(11 citation statements)

References 40 publications

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“…On the other hand, electrons or photons can mainly be applied for writing on soft materials (such as polymers or resists) and the corresponding feature sizes are determined by the proximity of the back‐scattered electrons or wave diffraction limits. Moreover, the lateral exposure in an ion beam is very low, thereby exposing only the correct areas and writing very narrow lines in the substrate, which makes it more capable to directly fabricate nanostructures 5–7…”

Section: Ions and Interactionsmentioning

confidence: 99%

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Recent Developments in Nanofabrication Using Ion Projection Lithography

Tseng

2005

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Ion projection lithography (IPL) is an emerging technology and a major candidate for the next-generation lithography (NGL) designed to complement and supplement current optical lithographic techniques for future chip manufacturing. In this Review, the recent developments of IPL technology are examined with an emphasis on its ability to fabricate a wide variety of nanostructures for the semiconductor industry. Following an introduction of the uniqueness and strength of the technology, the basics of ion-source development and ion-target interactions with and without chemical enhancement are presented. The developments in equipment systems, masks, and resists are subsequently studied. The resolution of printed nanostructures and the corresponding throughput of the current system are assessed for NGL. Finally, concluding remarks are presented to summarize the strengths and weaknesses of the current technology and to suggest the scope for future improvement.

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Section: Ions and Interactionsmentioning

confidence: 99%

“…Most of the IPL systems use open stencil masks for pattern transformation as indicated by many investigators 5. 6, 20 In the stencil mask, patterns are etched on the metal foils.…”

Section: Projection Masks and Resistsmentioning

confidence: 99%

Recent Developments in Nanofabrication Using Ion Projection Lithography

Tseng

2005

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“…While a number of fabrication techniques are currently available, the construction of hybrid nanostructures remains a challenge both technically and practically. The high‐resolution patterning of materials below 100 nm is generally achieved using focused electron or ion beams6, 7 in lithography processes or by writing with a scanning probe 8, 9. These methods, besides being serial and hence time consuming, demanding sophistication in instrumentation, are also less ideal for handling delicate synthesized or biological materials because of the relatively severe conditions required.…”

Section: Introductionmentioning

confidence: 99%

Large‐Area Nanoscale Patterning of Functional Materials by Nanomolding in Capillaries

Duan¹,

Zhao²,

Berenschot³

et al. 2010

Adv Funct Materials

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Within the past years there has been much effort in developing and improving new techniques for the nanoscale patterning of functional materials used in promising applications like nano(opto)electronics. Here a high‐resolution soft lithography technique—nanomolding in capillaries (NAMIC)—is demonstrated. Composite PDMS stamps with sub‐100 nm features are fabricated by nanoimprint lithography to yield nanomolds for NAMIC. NAMIC is used to pattern different functional materials such as fluorescent dyes, proteins, nanoparticles, thermoplastic polymers, and conductive polymers at the nanometer scale over large areas. These results show that NAMIC is a simple, versatile, low‐cost, and high‐throughput nanopatterning tool.

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“…The continued development of lithography technologies allows patterns to be produced with feature sizes well below 100 nm. However, the increasing cost and complexity of these lithographic techniques, e.g., deep UV and extreme UV photolithography, [1,2] soft X-ray lithography, [3] electron-beam writing, [4] and ion-beam lithography, [5] render them less suitable for exploratory research applications. Other ways of patterning structures in the $10-100 nm range may represent alternatives if they offer additional advantages in reduced production cost, increased throughput, or more flexibility regarding the material or function of the nanometric structures.…”

Section: Introductionmentioning

confidence: 99%

Nanopatterning by an Integrated Process Combining Capillary Force Lithography and Microcontact Printing

Duan

Zhao

Perl

et al. 2010

Adv Funct Materials

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A novel nanopatterning process was developed by combining capillary force lithography (CFL) and microcontact printing (µCP). Flat polydimethylsiloxane (PDMS) was used as the substrate in CFL, and after chemical functionalization, as the stamp in µCP, which increased the resolution of both methods. The polymer patterns, produced by CFL on a thin polymer film on the flat PDMS substrate, acted as a mask to oxidize the uncovered regions of the PDMS. The chemical patterns were subsequently formed by gas phase evaporation of a fluorinated silane. After removal of the polymer, these stamps were used to transfer thiol inks to a gold substrate by µCP. Gold patterns at a scale of less than 100 nm were successfully replicated by these chemically patterned flat PDMS stamps.

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An overview of ion beam lithography for nanofabrication

Cited by 22 publications

References 40 publications

Recent Developments in Nanofabrication Using Ion Projection Lithography

Recent Developments in Nanofabrication Using Ion Projection Lithography

Large‐Area Nanoscale Patterning of Functional Materials by Nanomolding in Capillaries

Nanopatterning by an Integrated Process Combining Capillary Force Lithography and Microcontact Printing

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