2020
DOI: 10.1007/s41871-020-00066-3
|View full text |Cite
|
Sign up to set email alerts
|

An Investigation of Effect of Stand-Off Distance on the Material Removal Characteristics and Surface Generation in Fluid Jet Polishing

Abstract: Fluid jet polishing (FJP) is a versatile polishing process that has many advantages compared to other polishing processes. Stand-off distance (SOD) is one of the key parameters in fluid jet polishing. However, relatively little research work has been carried out to investigate its effect of SOD on material removal characteristics and surface generation in FJP. In this paper, a systematic investigation of the effect of SOD on the tool influence function and surface topography in FJP was conducted. Experiments w… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
7
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 15 publications
(7 citation statements)
references
References 27 publications
(31 reference statements)
0
7
0
Order By: Relevance
“…The parametric study to determine the optimized polishing pressure, stand-off distance and polishing time to maximize the percentage change in surface roughness (% ΔR a ) in polishing AISI H13 die material is conducted using design of experiment (DOE) technique. These are the most critical parameters for transformation of W-shaped sectioned profile (central uncut material) to U-shaped sectional profile (uniform material removal) as reported by Wang et al 23 The central composite design (CCD) technique of response surface methodology (RSM) is used in the present work with three variables and five levels of each variable. The CCD method gives the central repeatability of process parameters to ensure the accuracy of the developed data/model.…”
Section: Design Of Experiments Using Ccd Techniquementioning
confidence: 99%
See 4 more Smart Citations
“…The parametric study to determine the optimized polishing pressure, stand-off distance and polishing time to maximize the percentage change in surface roughness (% ΔR a ) in polishing AISI H13 die material is conducted using design of experiment (DOE) technique. These are the most critical parameters for transformation of W-shaped sectioned profile (central uncut material) to U-shaped sectional profile (uniform material removal) as reported by Wang et al 23 The central composite design (CCD) technique of response surface methodology (RSM) is used in the present work with three variables and five levels of each variable. The CCD method gives the central repeatability of process parameters to ensure the accuracy of the developed data/model.…”
Section: Design Of Experiments Using Ccd Techniquementioning
confidence: 99%
“…The decrease in % ΔR a at higher stand-off distance is due to over polishing with the simultaneous increase in these two parameters. 23 The interaction of stand-off distance and polishing time is plotted in Figure 4. Figure 4(a) and (b) indicates that the maximum % ΔR a is observed at stand-off distance of 32 mm for the time period between 170 sec and 180 sec.…”
Section: Effect Of Stand-off Distance and Polishing Time On Surface R...mentioning
confidence: 99%
See 3 more Smart Citations