2012
DOI: 10.1016/j.tsf.2011.12.081
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An InP/InGaAs metamorphic δ-doped heterojunction bipolar transistor with high current gain and low offset voltage

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Cited by 6 publications
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“…Compared with the homojunction, by changing the band gap and carrier transmission via structural design, it is possible to improve the properties of a semiconductor device. In 2012, Tsai et al proposed an InP/InGaAs heterojunction transistor, achieving a direct current (DC) voltage gain ( β ) of 255 [ 1 ]. In 2013, Narang et al fabricated a Ga 0.5 In 0.5 P/GaAs heterojunction transistor to realize a DC voltage gain ( β ) of 100–120 [ 2 ].…”
Section: Introductionmentioning
confidence: 99%
“…Compared with the homojunction, by changing the band gap and carrier transmission via structural design, it is possible to improve the properties of a semiconductor device. In 2012, Tsai et al proposed an InP/InGaAs heterojunction transistor, achieving a direct current (DC) voltage gain ( β ) of 255 [ 1 ]. In 2013, Narang et al fabricated a Ga 0.5 In 0.5 P/GaAs heterojunction transistor to realize a DC voltage gain ( β ) of 100–120 [ 2 ].…”
Section: Introductionmentioning
confidence: 99%