An Enhanced Flexible Color Filter Via Imprint Lithography and Inkjet Deposition Methods

Holland, E.R.; Jeans, Albert; Mei, Ping; Taussig, Carl; Elder, Richard; Bell, Cynthia S.; Howard, Emmett; Stowell, John; O’Rourke, Shawn M.

doi:10.1109/jdt.2010.2090860

Cited by 7 publications

(9 citation statements)

References 10 publications

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“…The R2R NIL using roll coating mechanism was also adapted for fabrication of color filters for flexible display by Hewlett-Packard Laboratory and Arizona State University in 2011 [7]. Besides the roll coating mechanism, valve jet or spray coating is also commonly used in R2R NIL processes as shown in Figure 12.…”

Section: Reviewmentioning

confidence: 99%

“…As the NIL process is based on direct mechanical deformation, its resolution is not constrained to the limitations of light diffraction or beam scattering factors as observed in conventional nanolithography methods [ 4 ]. In terms of patterning capability, various 2D and 3D structures [ 5 ] with feature sizes ranging from several micrometers [ 6 , 7 ] down to sub-50-nm scale [ 8 - 10 ] have been demonstrated. Due to its promising potential, the NIL process has been added into the International Technology Roadmap for Semiconductors (ITRS) for 32- and 22-nm nodes [ 11 ] and has been widely researched and improvised by many researchers ever since, resulting in several variations of the process.…”

Section: Reviewmentioning

confidence: 99%

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A review of roll-to-roll nanoimprint lithography

et al. 2014

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Since its introduction in 1995, nanoimprint lithography has been demonstrated in many researches as a simple, low-cost, and high-throughput process for replicating micro- and nanoscale patterns. Due to its advantages, the nanoimprint lithography method has been rapidly developed over the years as a promising alternative to conventional nanolithography processes to fulfill the demands generated from the recent developments in the semiconductor and flexible electronics industries, which results in variations of the process. Roll-to-roll (R2R) nanoimprint lithography (NIL) is the most demanded technique due to its high-throughput fulfilling industrial-scale application. In the present work, a general literature review on the various types of nanoimprint lithography processes especially R2R NIL and the methods commonly adapted to fabricate imprint molds are presented to provide a clear view and understanding on the nanoimprint lithography technique as well as its recent developments.PACS81.16.Nd

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Section: Reviewmentioning

confidence: 99%

Section: Reviewmentioning

confidence: 99%

A review of roll-to-roll nanoimprint lithography

et al. 2014

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“…This imprinting technique, based on nanoimprint lithography [ 22 , 23 ], allows for tailoring three-dimensional micro- and nanostructured surfaces of targeted pathogens onto a surface. By using nanoimprinting lithography, three-dimensional structures with sizes ranging from several micrometers to sub-nanometer scales can be realized [ 24 , 25 ]. Studies utilizing bacteria-imprinted PDMS suggested that the morphology and the chemical fingerprint of the targeted bacteria in the imprint cavities play a role in the re-adsorption of the bacteria [ 20 ].…”

Section: Introductionmentioning

confidence: 99%

Pathogen-Imprinted Organosiloxane Polymers as Selective Biosensors for the Detection of Targeted E. coli

Dulay¹,

Zaman²,

Jaramillo³

et al. 2018

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Early detection of pathogens requires methods that are fast, selective, sensitive and affordable. We report the development of a biosensor with high sensitivity and selectivity based on the low-cost preparation of organosiloxane (OSX) polymers imprinted with E. coli-GFP (green fluorescent protein). OSX polymers with high optical transparency, no cracking, and no shrinkage were prepared by varying several parameters of the sol-gel reaction. The unique shape and chemical fingerprint of the targeted inactivated E. coli-GFP were imprinted into bulk polymers by replication imprinting where the polymer solution was dropcast onto a bacteria template that produced a replica of the bacterial shape and chemistry on the polymer surface upon removal of the template. Capture performances were studied under non-laminar flow conditions with samples containing inactivated E. coli-GFP and compared to inactivated S. typhimurium-GFP. Capture selectivity ratios are dependent on the type of alkoxysilanes used, the H 2 O:silane molar ratio, and the polymerization temperature. The bacteria concentration in suspension ranged from~6 × 10 5 to 1.6 × 10 9 cells/mL. E. coli-imprinted OSX polymers with polyethylene glycol (PEG) differentiated between the targeted bacterium E. coli, and non-targeted bacteria S. typhimurium and native E. coli-GFP, achieving selectivity ratios up to 4.5 times higher than polydimethylsiloxane (PDMS) and OSX polymers without PEG.

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“…From various researches, various 2D and 3D structures [7] with feature sizes ranging from several micrometres [1,8] down to sub-50 nm [9][10][11] scale have been successfully replicated using NIL process. However, the conventional NIL method using plate-to-plate (P2P) contact is not suitable for large area imprinting due to its high-force [12] and vacuum environment requirements [7,9], low throughput [13,14] and non-uniformity issues [15].…”

Section: Introductionmentioning

confidence: 99%

“…Its suitability for large area imprinting also observed the roller-based NIL processes being widely applied in industries for the fabrication of flexible electronics as seen in the work of Zang and Liang from SiPix Inc. [17], J-G. Kim [8]. However, most of the UV-based roller nanoimprint system utilises specially formulated solvent-free resist [8] or low-viscosity resist [16], which is much costlier as compared to commercially available solvent-based resist such as MicroChem SU-8, a negative photoresist. In this work, a prototype of roll-to-roll ultraviolet nanoimprint lithography (R2R-UV-NIL) system was developed in-house for patterning of micro-/nanostructures using solvent-based SU-8 2002 epoxy photoresist from MicroChem.…”

Section: Introductionmentioning

confidence: 99%

Development of a low cost roll-to-roll nanoimprint lithography system for patterning 8-inch wide flexible substrates

Mohamed

Kooy

Ibrahim

2014

IJNT

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Recent developments in flexible electronics, solar cells, displays, bio-chips and wearable technology have featured various micro/nanostructures in system designs. However, fabricating these micro/nanostructures on flexible substrates using existing technology such as photolithography, electron beam lithography (EBL) and other lithography techniques is troublesome, time consuming and costly. An in-house roll-to-roll ultraviolet nanoimprint lithography (R2R-UVNIL) system was designed and fabricated as an alternative low cost and large area patterning tool. It consists of a coating unit, soft-bake unit and imprinting unit which are connected together using a series of rollers. The aim of the integrated soft-bake stage was to minimise the mould sticking issues during the continuous R2R imprinting using solvent-based resist. The assembled R2R-UVNIL system was tested with imprinting process on an untreated commercial polyethylene terephthalate (PET) film as the flexible substrate, solvent-based SU8-2002 photopolymer as the resist and PDMS soft mould as the imprinting mould. The PDMS soft mould was replicated from an EBL patterned silicon master mould. Imprinting speeds of 50 to 150 mm/min have been achieved in this work, with relatively sound replication quality and formability for patterning sub-2 µm microstructures.

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An Enhanced Flexible Color Filter Via Imprint Lithography and Inkjet Deposition Methods

Cited by 7 publications

References 10 publications

A review of roll-to-roll nanoimprint lithography

A review of roll-to-roll nanoimprint lithography

Pathogen-Imprinted Organosiloxane Polymers as Selective Biosensors for the Detection of Targeted E. coli

Development of a low cost roll-to-roll nanoimprint lithography system for patterning 8-inch wide flexible substrates

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