2007 IEEE Symposium on VLSI Circuits 2007
DOI: 10.1109/vlsic.2007.4342741
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An Area-Conscious Low-Voltage-Oriented 8T-SRAM Design under DVS Environment

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Cited by 120 publications
(65 citation statements)
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“…In 0.18μm technology, length of the transistor is varied from 0.6 μm to 0.12 μm, because of the increase in the length, surface area as well as power consumption of the total circuit elements will be reduced. Fig.3 shows the complete layout of the 8T cell with 0.18μmTechnology [9]. …”
Section: T Sram Cell Layout Designmentioning
confidence: 99%
“…In 0.18μm technology, length of the transistor is varied from 0.6 μm to 0.12 μm, because of the increase in the length, surface area as well as power consumption of the total circuit elements will be reduced. Fig.3 shows the complete layout of the 8T cell with 0.18μmTechnology [9]. …”
Section: T Sram Cell Layout Designmentioning
confidence: 99%
“…Double-ended 6T (6 transistors) SRAM cells have been widely deployed for high voltage operation. Numerous SRAM cell designs such as 8T [16], Schmitt-Trigger 10T (10T) [12], etc. target different voltage and robustness scenarios.…”
Section: Related Workmentioning
confidence: 99%
“…Consequently, VARIUS-NTV uses the 8-transistor cell of Figure 4(b) [8], [29]. This cell is easier to design reliably because it decouples the transistors used for reading (AX RD and N RD ) and those for writing (the rest).…”
Section: B Sram Cellmentioning
confidence: 99%