An Approach for Factory-Wide Control Utilizing Virtual Metrology

Khan, Aftab Aslam Parwaz; Moyne, James; Tilbury, Dawn M.

doi:10.1109/tsm.2007.907609

Cited by 120 publications

(63 citation statements)

References 20 publications

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…Uma abordagem para índices de capacidade de processos não normais é apresentada por Luceño (1996) que afirma que o valor de Cp não é uma variável aleatória e pode ser substituído por um estimador: o desvio padrão de uma amostra (LUCEÑO, 2000), quando a população tem uma distribuição normal (KHAN et al, 2007). Quando não é normal Luceño (1996) sugere um novo índice de capacidade de processo que é insensível a afastamentos da distribuição normal, o Índice de Capacidade de Confiança (Cpc).…”

Section: Introductionunclassified

Avaliação da distribuição de sementes por uma semeadora de anel interno rotativo utilizando média móvel exponencial

Albiero¹,

Maciel²,

Milan³

et al. 2012

Rev. Ciênc. Agron.

View full text Add to dashboard Cite

Resumo -Conceitos de qualidade cada vez mais se tornam essenciais para a sobrevivência da empresa agrícola, pois a importância do aprimoramento das operações agrícolas se faz necessária para a obtenção de resultados viáveis economicamente, ambientamente e socialmente. Uma das dimensões da qualidade é conseguir de conformidade, ou seja, a garantia de execução exata do que foi planejado para atender aos requisitos dos clientes em relação a um determinado produto ou serviço. Os objetivos deste trabalho são avaliar a distribuição longitudinal entre sementes de uma semeadora de anel interno rotativo, e propor a utilização da metodologia estatística da Média Móvel Exponencialmente Ponderada (MMEP) como alternativa para o controle de qualidade da semeadura, quando não há normalidade da distribuição dos dados. Os resultados demonstraram que a MMEP é adequada para a avaliação da qualidade da distribuição longitudinal de sementes, pois concordou com os dados apresentados na estatística descritiva, o que lhe credencia para avaliação de distribuições não normais. Palavras-chave -Uniformidade de distribuição. Controle de Qualidade. Média móvel.Abstract -Quality concepts are essentials for survivor of agricultural companies, therefore, the importancy of improvement of agricultural process is necessary for to get results economically, environmentally and socially viables. One quality dimension is to get a compliance quality, ie, ensure the exact execution than was planned. The subject of this paper is evaluable at longitudinal distribution between seed of a internal ring seeder. The subject of this paper is to evaluate at longitudinal distribution between seed distributed for a internal ring seeder and to propose the use of statistical methodology exponentially weighted moving average (MMEP) like alternative for the quality control of seeders, when there is not normality in data. The results showed that the MMEP is adequate for quality evaluation of longitudinal distribution between seeds, as agreed with the data of descriptive statistic.

show abstract

Section: Introductionunclassified

Avaliação da distribuição de sementes por uma semeadora de anel interno rotativo utilizando média móvel exponencial

Albiero¹,

Maciel²,

Milan³

et al. 2012

Rev. Ciênc. Agron.

View full text Add to dashboard Cite

show abstract

“…Failure detection is being augmented with failure prediction to support capabilities such as PdM. Metrology measurement prediction using VM is being leveraged to reduce cycle times due to metrology delay and improve process capability [36,37]. Predictive scheduling, first at the process level and eventually at the across-fab level is beginning to be leveraged to lessen some capacity constraints [38].…”

Section: Emerging Apc Analytics Applications and Analytics Trends In mentioning

confidence: 99%

Big Data Analytics for Smart Manufacturing: Case Studies in Semiconductor Manufacturing

2017

View full text Add to dashboard Cite

Smart manufacturing (SM) is a term generally applied to the improvement in manufacturing operations through integration of systems, linking of physical and cyber capabilities, and taking advantage of information including leveraging the big data evolution. SM adoption has been occurring unevenly across industries, thus there is an opportunity to look to other industries to determine solution and roadmap paths for industries such as biochemistry or biology. The big data evolution affords an opportunity for managing significantly larger amounts of information and acting on it with analytics for improved diagnostics and prognostics. The analytics approaches can be defined in terms of dimensions to understand their requirements and capabilities, and to determine technology gaps. The semiconductor manufacturing industry has been taking advantage of the big data and analytics evolution by improving existing capabilities such as fault detection, and supporting new capabilities such as predictive maintenance. For most of these capabilities: (1) data quality is the most important big data factor in delivering high quality solutions; and (2) incorporating subject matter expertise in analytics is often required for realizing effective on-line manufacturing solutions. In the future, an improved big data environment incorporating smart manufacturing concepts such as digital twin will further enable analytics; however, it is anticipated that the need for incorporating subject matter expertise in solution design will remain.

show abstract

“…Advanced process control (APC) and virtual metrology (VM) are enabling technologies that can resolve the control issues in semiconductor manufacturing [6]. Virtual metrology is the estimation of process metrology variables that may be expensive or difficult to measure using readily available process information.…”

Section: Introductionmentioning

confidence: 99%

“…1. Fab-wide VM schemes that are capable of increasing factory throughput, reducing wafer scraps, cutting production costs, and paving the way to fully automated wafer-2-wafer (W2W) control have been investigated [7,6,8].…”

Section: Introductionmentioning

confidence: 99%

Real-time virtual metrology and control for plasma etch

Lynn¹,

MacGearailt

Ringwood³

2012

Journal of Process Control

View full text Add to dashboard Cite

a b s t r a c tPlasma etch is a semiconductor manufacturing process during which material is removed from the surface of semiconducting wafers, typically made of silicon, using gases in plasma form. A host of chemical and electrical complexities make the etch process notoriously difficult to model and troublesome to control. This work demonstrates the use of a real-time model predictive control scheme to control plasma electron density and plasma etch rate in the presence of disturbances to the ground path of the chamber. Virtual metrology (VM) models, using plasma impedance measurements, are used to estimate the plasma electron density and plasma etch rate in real time for control, eliminating the requirement for invasive measurements. The virtual metrology and control schemes exhibit fast set-point tracking and disturbance rejection capabilities. Etch rate can be controlled to within 1% of the desired value. Such control represents a significant improvement over open-loop operation of etch tools, where variances in etch rate of up to 5% can be observed during production processes due to disturbances in tool state and material properties.

show abstract

An Approach for Factory-Wide Control Utilizing Virtual Metrology

Cited by 120 publications

References 20 publications

Avaliação da distribuição de sementes por uma semeadora de anel interno rotativo utilizando média móvel exponencial

Avaliação da distribuição de sementes por uma semeadora de anel interno rotativo utilizando média móvel exponencial

Big Data Analytics for Smart Manufacturing: Case Studies in Semiconductor Manufacturing

Real-time virtual metrology and control for plasma etch

Contact Info

Product

Resources

About