2022
DOI: 10.1021/acsphotonics.1c01316
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An AlGaN/GaN Dual Channel Triangular Microcantilever Based UV Detector

Abstract: The UV detection capabilities of III-nitride dual channel triangular microcantilevers, consisting of AlGaN/GaN two-dimensional electron gas channels with an intervening GaN layer, were investigated using 265, 315, and 375 nm illumination. High spectral responsivities, up to 2.3 × 10 4 A/W, were observed along with a very low dark current of a few pA, which resulted in a detectivity of 4.99 × 10 8 Jones. A high UV−visible rejection ratio of 10 4 was also measured between the wavelengths of 265 and 450 nm. A sim… Show more

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Cited by 9 publications
(3 citation statements)
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“…Under UV illumination, the majority of the incident light is absorbed by the GaN channel layer and then converted efficiently to photocarriers, which turns on the 2DEG channel and then induces a very large photocurrent collected by the drain. As compared with the traditional single heterojunction HEMTs with full recess structure, ,,, the as-fabricated AlGaN/GaN double-channel HEMT PDs retain 2DEG channel with low etch damage in gate region, which has high mobility for the large photocurrent and the fast response speed.…”
Section: Resultsmentioning
confidence: 99%
“…Under UV illumination, the majority of the incident light is absorbed by the GaN channel layer and then converted efficiently to photocarriers, which turns on the 2DEG channel and then induces a very large photocurrent collected by the drain. As compared with the traditional single heterojunction HEMTs with full recess structure, ,,, the as-fabricated AlGaN/GaN double-channel HEMT PDs retain 2DEG channel with low etch damage in gate region, which has high mobility for the large photocurrent and the fast response speed.…”
Section: Resultsmentioning
confidence: 99%
“…A schematic of the layer structures is shown in the inset of Figure 1b. The microcantilever sensors were fabricated by following well-established procedures established earlier [28,29]. In the first step, the AlGaN barrier layer was etched to a depth of 100 nm using BCl 3 /Cl 2 plasma chemistry, leaving the channel mesa areas with 2DEG formed at the AlGaN/GaN heterostructure interface.…”
Section: Methodsmentioning
confidence: 99%
“…This device shows promise for sequentially charging multiple capacitors over time, enabling the storage of substantial energy for applications such as wearable/implantable devices and smart monitoring systems [66][67][68]. They also open up cations in sensing force, strain, and pressure, offering credible competition to existing inorganic piezo-based material sensors, including those based on PZT [69], LiNbO3 [70], and III-Nitrides [71][72][73].…”
Section: Piezoelectric Measurementmentioning
confidence: 99%