1991
DOI: 10.1016/s0022-3093(05)80360-6
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Amorphous silicon based radiation detectors

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Cited by 34 publications
(12 citation statements)
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“…As the electric field increases, injection from the doped layer and the Poole-Frenkel effect in the high-field region (close to the p-i interface) become dominant. In order to minimize this sharp increase of leakage current with growing electric field, several solutions have been proposed in the literature: (a) An increase of the p-layer thickness [34,35], (b) the introduction of a double p-layer [36] or (c) a buried p-layer [35], or (d) the introduction of a buffer layer at the p-i interface [37].All these solutions can be easily implemented and require minimal modifications of the fabrication process. However, it is not yet clear which solution offers the lowest leakage current as interface properties (rather than the intrinsic or doped layer properties) usually play the major role in controlling leakage.…”
Section: A-si:h For Particle Detection (Detection Scheme and Requiremmentioning
confidence: 99%
See 1 more Smart Citation
“…As the electric field increases, injection from the doped layer and the Poole-Frenkel effect in the high-field region (close to the p-i interface) become dominant. In order to minimize this sharp increase of leakage current with growing electric field, several solutions have been proposed in the literature: (a) An increase of the p-layer thickness [34,35], (b) the introduction of a double p-layer [36] or (c) a buried p-layer [35], or (d) the introduction of a buffer layer at the p-i interface [37].All these solutions can be easily implemented and require minimal modifications of the fabrication process. However, it is not yet clear which solution offers the lowest leakage current as interface properties (rather than the intrinsic or doped layer properties) usually play the major role in controlling leakage.…”
Section: A-si:h For Particle Detection (Detection Scheme and Requiremmentioning
confidence: 99%
“…The difficulty to achieve full collection on thick a Si:H diodes (as discussed in section 2.2) and the higher signal-to-noise ratios that could be obtained from the combination of thin a-Si:H photodiode coupled with CsI scintillator led to a shift of the interest to indirect detection scheme [36]. The integration of a Si:H photodiodes in an active matrix of a Si:H based transistors here allows for spatial detection and imaging.…”
Section: A-si:h For Particle Detection (Detection Scheme and Requiremmentioning
confidence: 99%
“…Since then there has been considerable research and development of this material leading to a variety of applications such as photovoltaic panels, thin film light emitting diodes, photosensors and thin film transistors [6][7][8][9][10].…”
Section: Hydrogenated Amorphous Siliconmentioning
confidence: 99%
“…For these reasons this material has attracted much attention for direct and indirect (using a scintillating layer) particle detection [2]. Using a direct detection scheme, various types of particles such as protons, neutron, electrons or X-ray were successfully detected using thick a-Si:H diode [3,4,5].…”
Section: Introductionmentioning
confidence: 99%