Amorphous molybdenum silicide layers and Mo/Si(100) interface growth: Local structure and preparation dependence

Meyerheim, H. L.; Döbler, U.; Puschmann, A.; Baberschke, K.

doi:10.1103/physrevb.41.5871

Cited by 13 publications

(5 citation statements)

References 28 publications

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“…34,37,42,47,48 Most researchers suggest that the amorphous interlayers at Mo/Si interfaces have a composition close to MoSi 2 . 35,38,43,47,[49][50][51][52][53] The formation of this silicide is in agreement with the Bene-Walser rule on the first phase nucleating at the interfaces. 54 However, some authors present results on the existing of lower silicides (Mo 5 Si 3 or Mo 3 Si) rather than the disilicide.…”

Section: Introductionsupporting

confidence: 79%

Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

et al. 2013

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By methods of cross-sectional transmission electron microscopy and small-angle x-ray scattering (λ ¼ 0.154 nm) the influence of Ar gas pressure (1 to 4 mTorr) on the growth of amorphous interfaces in Mo/Si multilayers (MLs) deposited by DC magnetron sputtering is studied. The significant reduction in the ML period, which is evident as a volumetric contraction, is observed in MLs deposited at Ar pressure where the mean-free path for the sputtered atoms is comparable with the magnetronsubstrate distance. Some reduction in the thickness of the amorphous interlayers with Ar pressure increase is found, where the composition of the interlayers is enriched with molybdenum. The interface modification resulted in an increase in EUV reflectance of the Mo/Si MLs.

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Section: Introductionsupporting

confidence: 79%

Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

et al. 2013

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“…X-ray photoelectron spectroscopy, and Auger electron spectroscopy were used [44][45][46] for a detailed study of the silicide phases formation processes at Mo-Si interfaces and also to measure the depth of interdi®usion of these materials. It was found that the width of a transition interlayer may vary widely and reach ¹ 2.5 nm, depending on the deposition technique and conditions.…”

Section: Mirrors For Euv-lithographymentioning

confidence: 99%

Multilayer optics for XUV spectral region: technology fabrication and applications

et al. 2003

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We present research investigations in the eld of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scienti c instrumentation. We discuss normal incidence multilayer optics in the spectral region of \water window", multilayer optics for collimation and focusing of hard X-rays, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography ( ¶ = 13nm) and short period multilayer optics.

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“…As for the composition, most scientists consider that the amorphous interlayers in MXMs fabricated by different methods consist of molybdenum disilicide (MoSi 2 ). 9,17,[19][20][21][22][23][24][25] In different studies focused on improving optical characteristic of Mo-Si multilayers the MXM reflectivity is shown to depend on the energy of deposited atoms. [26][27][28] In particular, lowering the deposited atom energy by increasing the sputtering gas pressure results in interfaces roughening and vice versa.…”

Section: Introductionmentioning

confidence: 99%

The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

et al. 2011

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Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (λ=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers.

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Amorphous molybdenum silicide layers and Mo/Si(100) interface growth: Local structure and preparation dependence

Cited by 13 publications

References 28 publications

Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

Multilayer optics for XUV spectral region: technology fabrication and applications

The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers

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