“…34,37,42,47,48 Most researchers suggest that the amorphous interlayers at Mo/Si interfaces have a composition close to MoSi 2 . 35,38,43,47,[49][50][51][52][53] The formation of this silicide is in agreement with the Bene-Walser rule on the first phase nucleating at the interfaces. 54 However, some authors present results on the existing of lower silicides (Mo 5 Si 3 or Mo 3 Si) rather than the disilicide.…”