2015
DOI: 10.1016/j.actamat.2015.02.012
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Amorphous intergranular films as toughening structural features

Abstract: The ability of amorphous intergranular films to mitigate damage formation at grain boundaries is studied with molecular dynamics simulations. We find that such films can alter both crack nucleation and crack growth rates by efficiently absorbing dislocations, with thicker films being more effective sinks. Local plastic strain brought by incoming dislocations is diffused into a triangular region within the amorphous film and is accommodated by a flow of boundary atoms which resembles a vortex shape; this vortex… Show more

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Cited by 110 publications
(58 citation statements)
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“…The reason for choosing the orientation is here that the resolved shear stress is highest on the slip plane and dislocations can be driven towards the interface[33]. Tensile deformation of the nanolaminates with various layer thicknesses ranging from 1 nm to 10 nm is simulated to investigate size effects.…”
mentioning
confidence: 99%
“…The reason for choosing the orientation is here that the resolved shear stress is highest on the slip plane and dislocations can be driven towards the interface[33]. Tensile deformation of the nanolaminates with various layer thicknesses ranging from 1 nm to 10 nm is simulated to investigate size effects.…”
mentioning
confidence: 99%
“…On the other hand, disordered intergranular films may potentially improve the ductility of nanocrystalline materials by facilitating grain boundary sliding [13,14] and by efficiently suppressing crack nucleation and growth induced due to repeated dislocation adsorption at grain boundaries [15,16]. Since complexions offer interesting opportunities for materials design and optimization, the thermodynamics associated with complexion transitions are of great interest.…”
Section: Introductionmentioning
confidence: 99%
“…42 However, complexions are not always deleterious to mechanical properties. Molecular dynamic simulations by Pan and Rupert 43,44 on…”
Section: Introductionmentioning
confidence: 99%