2006
DOI: 10.1016/j.tsf.2006.05.016
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Amorphous carbon nitrogenated films prepared by plasma immersion ion implantation and deposition

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Cited by 16 publications
(10 citation statements)
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“…Besides plasma reactivity and species availability, another factor that influences the concentration of C-H in the film is ion bombardment promoted by the self-bias voltage of the driven electrode. Indeed, the proportion of argon in the plasma itself influences the ion bombardment process [ 22 ]. Thus, the presence of argon affects the proportion of C-H in the solid phase [ 21 , 22 ].…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Besides plasma reactivity and species availability, another factor that influences the concentration of C-H in the film is ion bombardment promoted by the self-bias voltage of the driven electrode. Indeed, the proportion of argon in the plasma itself influences the ion bombardment process [ 22 ]. Thus, the presence of argon affects the proportion of C-H in the solid phase [ 21 , 22 ].…”
Section: Resultsmentioning
confidence: 99%
“…Indeed, the proportion of argon in the plasma itself influences the ion bombardment process [ 22 ]. Thus, the presence of argon affects the proportion of C-H in the solid phase [ 21 , 22 ].…”
Section: Resultsmentioning
confidence: 99%
“…Modification of the plasma conditions may produce surfaces with different characteristics 9,10 . One of the surface properties that may be greatly modified by plasma exposure is the contact angle.…”
Section: Resultsmentioning
confidence: 99%
“…Films were produced by PECVD in a conventional in-house built radiofrequency system described in detail elsewhere [17]. In brief, a cylindrical stainless-steel chamber is fed gases via precision flowmeters and vapors of liquid monomers from glass vessels sealed by needle valves.…”
Section: Methodsmentioning
confidence: 99%