Articles you may be interested inSchottky-barrier lowering in silicon nanowire field-effect transistors prepared by metal-assisted chemical etching Appl. Phys. Lett. 98, 102113 (2011); 10.1063/1.3565971 Hydrogenated amorphous silicon nanowire transistors with Schottky barrier source/drain junctions Appl. Phys. Lett. 97, 143509 (2010); 10.1063/1.3499288 Contact mechanisms and design principles for (Schottky and Ohmic) metal contacts to semiconductor nanowires Arrays of Ni nanowire/multiwalled carbon nanotube/amorphous carbon nanotube heterojunctions containing Schottky contacts Appl. Phys. Lett. 90, 033114 (2007);Schottky contacts to n-type silicon nanowires were fabricated using Ni or nickel silicide contacts in a wraparound or end contact geometry, respectively. Series resistance in the test structures was reduced by heavily doping the opposite end of the silicon nanowire, facilitating Ohmic contact formation and reducing the resistance of the nanowire itself. The effective Schottky barrier height is reported as a function of nanowire doping, ambient, and applied back gate bias, highlighting some of the important variables affecting current transport in Schottky contacts to semiconductor nanowires. For the silicide contact to the most lightly doped silicon nanowire, measurements in N 2 showed that the effective barrier height without a back gate bias was 0.69 eV, and the ideality factor was 1.1.