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Limb, Scott J.; Lau, Kenneth K. S.; Edell, David J.; Gleason, Edward F.; Gleason, Karen K.

doi:10.1023/a:1021899414807

Cited by 128 publications

(141 citation statements)

References 17 publications

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“…In contrast to PECVD, there is no UV irradiation or ion bombardment in the iCVD process, so the resulting films have lower densities of dangling bonds and crosslinks than films grown using plasma excitation. [27] The lack of crosslinking facilitates the characterization of iCVD films because they are readily soluble and thus can be characterized by solution-state NMR spectroscopy and gel permeation chromatography. This paper reports the deposition of PMMA thin films using iCVD from MMA as a precursor.…”

Section: Introductionmentioning

confidence: 99%

Initiated CVD of Poly(methyl methacrylate) Thin Films

Chan

Gleason

2005

Chem. Vap. Deposition

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Initiated CVD (iCVD), a dry method, is able to produce poly(methyl methacrylate) (PMMA) thin films by utilizing a reactive gaseous mixture of the monomer methyl methacrylate and the initiator triethylamine. The deposition rate is twenty times faster with the use of the initiator. Fourier-transform infrared (FTIR) spectroscopy and X-ray photoelectron spectroscopy (XPS) show high structural resemblance between iCVD PMMA and conventional PMMA, and the degree of functionality retention increases with decreasing residence time in the vacuum chamber. XPS detection of nitrogen incorporation is consistent with the incorporation of the initiator into the polymer chains. NMR spectroscopy on completely dissolved films shows that the tacticity of iCVD PMMA resembles that of conventional, radically polymerized PMMA. Altogether these observations support the hypothesis that, for iCVD PMMA, the polymerization is by a free-radical mechanism.

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Section: Introductionmentioning

confidence: 99%

Initiated CVD of Poly(methyl methacrylate) Thin Films

Chan

Gleason

2005

Chem. Vap. Deposition

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“…This trend is consistent with the brittleness observed with increasing T-group concentration in organosilicon films deposited by plasma CVD by Cech et al 17 and also with the higher rigidity of ladderlike siloxane polymers (consisting almost entirely of T-groups) relative to linear polysiloxanes. 18 This test demonstrates a qualitative similarity between these coatings and fluorocarbon coatings deposited from hexafluoropropylene oxide by Limb et al 19 Fluorocarbon coatings with a high degree of crosslinking were found to be more brittle than those consisting of mostly linear chains.…”

Section: Thermal Analysismentioning

confidence: 53%

Effect of filament temperature on the chemical vapor deposition of fluorocarbon–organosilicon copolymers

Murthy

Olsen

Gleason

2003

J of Applied Polymer Sci

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ABSTRACT:The effect of filament temperature on the hot-filament chemical vapor deposition (HFCVD) of fluorocarbon-organosilicon copolymer thin films from 1,3,5-trivinyl-1,3,5-trimethylcyclotrisiloxane (V 3 D 3 ) and perfluorooctane sulfonyl fluoride (PFOSF) was examined. Significant changes in chemical structure occur as the filament temperature is varied, and these changes give rise to differences in thermal and mechanical properties. When the filament temperature is low, the films consist primarily of carbon-backbone polymer chains with siloxane ring pendant groups. When higher filament temperatures are used, the film structure consists of siloxane-backbone chains with some degree of crosslinking. Films produced with low filament temperatures have a greater degree of thermal stability and flexibility than those produced with high filament temperatures.

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“…Ultrahigh mass accuracy could distinguish between these two possibilities due to the fact that the fluorine has a slight mass defect of Ϫ0.0016 Da 23 ; however, this was not possible owning to the actual resolution level. Isotope abundance, at the same time, can help to distinguish between these two possibilities; the isotope with one 13 C, observed at one Da higher, for an ion containing 15 carbon atoms is expected to be about 17% (1.1% 13 C per carbon atom 24 ), whereas the 13 C contribution for an ion composed of 34 carbons is theoretically about 37%. The measured value of 35% (see Fig.…”

Section: Resultsmentioning

confidence: 99%

“…Similar data have been reported later by Limb at al. 13 Recently, it has been suggested that cyclic aromatic fluorocarbons like hexafluorobenzene undergo ring-opening processes under cold plasma conditions rather than defluorination mechanisms.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and characterization of Teflon-like macromolecular structures from dodecafluorocyclohexane and octadecafluorodecalin under RF-cold-plasma conditions

Dénès¹,

Hua²,

Simonsick³

et al. 1999

J. Appl. Polym. Sci.

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ABSTRACT:The chemical inertness, thermal stability, and low dielectric constant characteristics of polytetrafluoroethylene make this polymer very attractive for advanced technology applications. Current production technologies are not adequate for the deposition of often desired, thin-layer Teflon coatings. In this article the synthesis and characterization of Teflon-like macromolecular structures from dodecafluorocyclohexane and octadecafluorodecaline vapors under RF-cold-plasma conditions is discussed. It was demonstrated, based on high-resolution ESCA, ATR-FTIR, and LD-FT-ICR-MS investigations, that the deposited Teflon-like layers are built of CF, CF 2 , CF 3 , and ex situ origin COO groups with an over 60% fluorine content, and that they have a branched and/or crosslinked nature. These structures have a relatively high thermal stability (340°C) and are characterized by a low dielectric constant (2.1). Plasmaenhanced coatings of Teflon-like layers can be performed at room temperatures at large substrate areas.

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Untitled

Cited by 128 publications

References 17 publications

Initiated CVD of Poly(methyl methacrylate) Thin Films

Initiated CVD of Poly(methyl methacrylate) Thin Films

Effect of filament temperature on the chemical vapor deposition of fluorocarbon–organosilicon copolymers

Synthesis and characterization of Teflon-like macromolecular structures from dodecafluorocyclohexane and octadecafluorodecalin under RF-cold-plasma conditions

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