Effect of filament temperature on the chemical vapor deposition of fluorocarbon–organosilicon copolymers

Murthy, Shashi K.; Olsen, Bradley D.; Gleason, Karen K.

doi:10.1002/app.13342

Cited by 11 publications

(6 citation statements)

References 26 publications

(39 reference statements)

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“…In the spectrum of polyV 3 D 3 -HVDS (Fig 1d), a shoulder (that is not present in polyV 3 D 3 ) around 1080–1090 cm −1 is seen which is representative of linear Si-O chains and provides evidence for the incorporation of spacer molecule. This linear siloxane peak at 1080 cm −1 also appears in thermally ring-opened cyclic siloxanes 1,13. However, since all the polyV 3 D 3 -HVDS films were deposited at filament temperatures below 600°C, polymerization via ring-opening is not likely.…”

Section: Resultsmentioning

confidence: 92%

“…This linear siloxane peak at 1080 cm -1 also appears in thermally ring-opened cyclic siloxanes. 1,13 However, since all the polyV 3 D 3 -HVDS films were deposited at filament temperatures below 600 °C, polymerization via ring-opening is not likely. Furthermore, if the polymerization reaction had occurred via thermal ring-opening, the peak intensity at 1012 cm -1 (characteristic of trifunctional cyclic siloxanes) compared to that of pure polyV 3 D 3 should have reduced intensity as shown by O'Shaughnessy et al 1 When the spectra for polyV 3 D 3 and polyV 3 D 3 -HVDS are compared as shown in Figure 1b,d, the peak intensity shows no apparent reduction and confirms the incorporation of spacer as opposed to polymerization via ring opening.…”

Section: Resultsmentioning

confidence: 99%

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Incorporation of Linear Spacer Molecules in Vapor-Deposited Silicone Polymer Thin Films

et al. 2009

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Poly (trivinyl-trimethyl-cyclotrisiloxane) or polyV3D3 is a promising insulating thin film known for its potential application in neural probe fabrication. However, its time-consuming synthesis rate renders it impractical for manufacturing standards. Previously, the growth mechanism of polyV3D3 was shown to be affected by significant steric barriers. This article describes the synthesis of a copolymer of polyV3D3 via initiated chemical vapor deposition (iCVD) using V3D3 as the monomer, hexavinyl disiloxane (HVDS) as a spacer, and tert-butyl peroxide (TBP) as the initiator to obtain nearly a 4-fold increase in deposition rate. The film formation kinetics is limited by the adsorption of the reactive species on the surface of the substrate with an activation energy of −41.5 kJ/mol with respect to substrate temperature. The films deposited are insoluble in polar and non polar solvents due to their extremely crosslinked structure. They have excellent adhesion to silicon substrates and their adhesion properties are retained after soaking in a variety of solvents. Spectroscopic evidence shows that the films do not vary in structure after boiling in DI water for 1 hour, illustrating hydrolytic stability. PolyV3D3-HVDS has a bulk resistivity of 5.6 (±1) × 1014 Ω-cm, which is comparable to that of parylene-C; the insulating thin film currently used in neuroprosthetic devices.

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Section: Resultsmentioning

confidence: 92%

Section: Resultsmentioning

confidence: 99%

Incorporation of Linear Spacer Molecules in Vapor-Deposited Silicone Polymer Thin Films

et al. 2009

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“…The ability to grow fluorinated polymer films and structures from an underlying surface can circumvent many or all of these problems and is compatible with bottomup processing. Recently explored methods to grow fluorocarboncontaining films include chemical vapor deposition 8,9 and surface-initiated polymerization of fluorinated monomers. 1 We have recently reported a method to prepare partially fluorinated ultrathin polymer films onto a gold surface.…”

Section: Introductionmentioning

confidence: 99%

Effect of Fractional Fluorination on the Properties of ATRP Surface-Initiated Poly(hydroxyethyl methacrylate) Films

et al. 2004

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Acylation of a surface-initiated poly(hydroxyethyl methacrylate) (PHEMA) film with a perfluoroalkyl acid chloride (C 7 F 15 COCl) results in a highly blocking film with fluorocarbon side groups that orient at the airfilm interface to produce an ultralow-energy surface. The kinetics of the acylation step was monitored with reflectance-absorption infrared spectroscopy to reveal that the rate of fluorination depends on the chain length and solution concentration of the perfluorinated acid chloride as well as the solvent used. By control of the time of exposure to C 7 F 15 COCl, films with fractional conversion of the hydroxyl groups to fluorinated esters between 0 and 0.8 were produced. Increasing fractional conversion from 0 to ∼0.2 has a dramatic effect on surface wettability and electrochemical barrier properties as a densely packed, oriented fluorocarbon surface region is formed that greatly reduces water and ion transport. Additional fluorination has no effect on wettability but gradually increases film resistance while lowering film capacitance. These results suggest that structuring of fluorocarbon groups at the outermost surface of the film has a major impact on film properties and establish the minimum content of fluorocarbon groups required to achieve the structured interface via this grafting process.

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“…The characteristic absorptions in XG are well-known (26) and all are found in the virgin XG we used. The plasma-functionalized XG exhibits intense bands in the 800-1450 cm -1 region, including stretching of Si-N (27) and vibrations due to Si-O-Si and C-O-Si (28). The presence of bands around 1186, 1581, and 3315 cm -1 confirms that the primary amine groups have been successfully grafted due to plasma treatment and subsequent in situ reaction with ED.…”

Section: Resultsmentioning

confidence: 79%

Plasma-Enhanced Modification of Xanthan Gum and Its Effect on Rheological Properties

Jampala

Manolache

Gunasekaran

et al. 2005

J. Agric. Food Chem.

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The structure and rheological properties of xanthan gum (XG) modified in a cold plasma environment were investigated. XG was functionalized in a capacitively coupled 13.56-MHz radio frequency dichlorosilane (DS)-plasma conditions and, consecutively, in situ aminated by ethylenediamine. The surface structure of modified XG was evaluated on the basis of survey and high-resolution ESCA, FTIR, and fluorescence labeling techniques. The types of species generated in DS-plasma were reported using residual gas analysis (RGA). The aqueous solutions of modified XG were cross-linked and cured at room temperature to form stable gels. The dynamic rheological characteristics of virgin XG and functionalized and cross-linked XG were compared. It was found that parameters such as plasma treatment time and concentration of solutions can be optimized to form stable gels of XG. Thus, cold plasma technology is a novel, efficient, and nonenzymatic route to modify XG.

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Effect of filament temperature on the chemical vapor deposition of fluorocarbon–organosilicon copolymers

Cited by 11 publications

References 26 publications

Incorporation of Linear Spacer Molecules in Vapor-Deposited Silicone Polymer Thin Films

Incorporation of Linear Spacer Molecules in Vapor-Deposited Silicone Polymer Thin Films

Effect of Fractional Fluorination on the Properties of ATRP Surface-Initiated Poly(hydroxyethyl methacrylate) Films

Plasma-Enhanced Modification of Xanthan Gum and Its Effect on Rheological Properties

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