“…As it can be predicted, despite its costliness and additional complexities, lithography aided Al pre-texturing does away the need to perform double/multiple anodizations since high pore ordering is readily obtained through a single anodization process. The following are the major routes taken to achieve ideal pore arrangements in anodic alumina: -Imprint lithography (pattern transfer via embossing with a SiC mold [Masuda et al, 1997], SiN mold [Choi et al, 2003], commercial grating [Mikulskas et al, 2001], etc. ), -Focused ion-beam lithography (direct writing on Al [Peng et al, 2005;Robinson et al, 2007] or via photoresist patterning [Liu et al, 2003]), -Interference/holographic lithography (laser interference [Sun & Kim, 2002;Krishnan & Thompson, 2007]), -Pattern transfer via nano-sphere lithography (self assembly of colloidal particles followed by embossing [Fournier-Bidoz et al, 2004] or reactive-ion etching ), and -Pattern transfer via (Al) deposition on nano-structured substrates [Nishio et al, 2008].…”