2011
DOI: 10.1364/oe.19.00a657
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Alloy nanoparticle plasmon resonance for enhancing broadband antireflection of laser-textured silicon surfaces

Abstract: In this paper, Ag-Au alloy nanoparticles (NPs) were fabricated by dewetting process to enhance the broadband antireflection performance of textured silicon surfaces. The alloy NPs presented a large range of shapes and sizes, which provided an average reflectance (AR) below 4% over the spectral range of 300~1200 nm, a decrease of ~50% and ~90% as compared to the corresponding monometallic NPs and the original flat Si surfaces, respectively. The superior broadband antireflection demonstrated by the alloy NPs are… Show more

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Cited by 27 publications
(17 citation statements)
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“…In this method a metal thin-fi lm was deposited directly on the solar cell surface, followed by a thermal annealing process at about 200 ° C to transform the metal fi lm into nanoparticles. Reported deposition methods for plasmonic solar cells include thermal evaporation [10,12,16,20,24,34,79,80,81] , electron-beam evaporation [46] and sputtering [16] . With deposited fi lm thickness the same, evaporation and sputtering were found to produce identical nanoparticles [16] .…”
Section: Random Structuresmentioning
confidence: 99%
“…In this method a metal thin-fi lm was deposited directly on the solar cell surface, followed by a thermal annealing process at about 200 ° C to transform the metal fi lm into nanoparticles. Reported deposition methods for plasmonic solar cells include thermal evaporation [10,12,16,20,24,34,79,80,81] , electron-beam evaporation [46] and sputtering [16] . With deposited fi lm thickness the same, evaporation and sputtering were found to produce identical nanoparticles [16] .…”
Section: Random Structuresmentioning
confidence: 99%
“…To minimize unwanted reflections and improve the light collection efficiency, different types of anti-reflection surfaces have been investigated. [1][2][3]5,8,[12][13][14][15][16] Si is one of the most important materials in optical and optoelectronic devices.…”
Section: Introductionmentioning
confidence: 99%
“…22,23 There are several processing methods available for modifying the Si surface morphology. 1,5,7,[13][14][15]17,19,24,25 For example, etching methods, including chemical, electrochemical and dry etching, have been widely employed. 26,27 Dynamic etching of porous Si surfaces to a thickness of 100 nm has been demonstrated by Striemer and Fauchet, 27 who achieved an average reflection of 3.7% across the terrestrial solar spectrum.…”
Section: Introductionmentioning
confidence: 99%
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