All-polymer arrayed waveguide grating at 850  nm: design, fabrication, and characterization

Abstract

In this Letter, a novel all-polymer arrayed waveguide grating (AWG) device with an operating wavelength around 850 nm is reported. The all-polymer AWG consists of polymer ridge waveguides fabricated on a thin poly(methyl methacrylate) foil via microscope projection photolithography. The developed device is suitable to be integrated into optical circuits, e.g., a planar polymer foil and, along with other optical integrated devices, to be used for different sensing applications. The functionality of the device is demonstrated by using a fiber Bragg grating sensor and performing strain measurements.

Femtosecond time-resolved photoemission electron microscopy operated at sample illumination from the rear side

“…The ridges were lithographically structured using mask projection microscope photolithography, providing sub-200 nm resolution. [21][22][23][24] In all three samples, an ultrathin chromium adhesion layer between the gold film and substrate was used.…”

UV-LED-based projection lithography for rapid high-resolution micro- and nanostructuring

“…They were made of the organic-inorganic hybrid photopolymer. The functionality of obtained AWGs was briefly demonstrated in ref 27 . Further optical characterization of the functionalities of these produced elements will be investigated.…”

5-Channel Polymer/Silica Hybrid Arrayed Waveguide Grating

“…Specifically, AWG has advantages of low cost, large fabrication tolerance, and high performance, and has been widely studied. As the centerpiece of wavelength division multiplexing (WDM), AWG has been fabricated by silicon-on-insulator [5], SiO 2 [6,7], and polymers [8][9][10][11]. Though AWG has been highly developed by the standard industry technology of planar lightwave circuits (PLCs), and the cost is being gradually reduced by the mature fabrication process of silica-based waveguide [12][13][14], the polymer AWG has its own advantages and can avoid complex preparation processes such as thermal oxidation, plasma-enhanced chemical vapor deposition (PECVD), and inductively coupled plasma (ICP) etching [12][13][14].…”