2015
DOI: 10.1021/cs501532b
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ALD of Ultrathin Ternary Oxide Electrocatalysts for Water Splitting

Abstract: Semiconducting oxides, particularly mixtures of different transition-metal oxides, are promising materials for oxygen evolution reaction (OER) catalysts. Assessment of these materials is often complicated by inadequate dispersion of the materials, charge transport limitations, and lack of surface area characterization. Thin films deposited by atomic layer deposition (ALD) present an excellent way to overcome these issues. Here, we present the first work using ALD to investigate ternary oxide electrocatalysts, … Show more

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Cited by 39 publications
(37 citation statements)
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“…The doping ratio for each cycle ratio was estimated using the deposition rate of each material and the rule of mixture (ROM), which is used for calculating the composition of compound materials. 29 The estimated value of Gd 2 O 3 mol% for the ALD GDC samples ranged from 10 to 25 mol%. Doped-ceria materials show optimal characteristics for SOFC at doping ratios from 12 to 17 mol%.…”
Section: Resultsmentioning
confidence: 98%
See 1 more Smart Citation
“…The doping ratio for each cycle ratio was estimated using the deposition rate of each material and the rule of mixture (ROM), which is used for calculating the composition of compound materials. 29 The estimated value of Gd 2 O 3 mol% for the ALD GDC samples ranged from 10 to 25 mol%. Doped-ceria materials show optimal characteristics for SOFC at doping ratios from 12 to 17 mol%.…”
Section: Resultsmentioning
confidence: 98%
“…As summarized in Table 1, the ALD cycle ratios between CeO 2 and Gd 2 O 3 were adjusted from 5:1 to 2:1 in this experiment. The doping ratio for each cycle ratio was estimated using the deposition rate of each material and the rule of mixture (ROM), which is used for calculating the composition of compound materials 29 . The estimated value of Gd 2 O 3 mol% for the ALD GDC samples ranged from 10 to 25 mol%.…”
Section: Resultsmentioning
confidence: 99%
“…[38][39][40] Aw ide array of synthetic approaches has been proposed for the creation of these ideal nanostructures,which can be grouped into either top-down or bottom-up approaches ( Figure 4). [44,45] Thechoice of the method depends on architectural scale. This includes using soft and hard templates, high-precision machinery,size reduction, or main-component dissolution.…”
Section: Synthesis Approachesmentioning
confidence: 99%
“…[41][42][43] In the bottom-up approach, the electrode is built up atomby-atom, molecule-by-molecule,c luster-by-cluster,a nd particle-by-particle.F or example,electrodes have been fabricated using underpotential electrodeposition (UPD), layer-bylayer deposition (LBL), colloidal synthesis,a tomic layer deposition (ALD), and molecular layer deposition (MLD) for conformal coating of thin layers on asubstrate. [44,45] Thechoice of the method depends on architectural scale. Thebottom-up approach is the preferred choice for building up the nanoscale structure.T he essence of the electrode architecture formation from vapor,l iquid, or solid phase in the bottom-up approach is the nucleation and growth.…”
Section: Synthesis Approachesmentioning
confidence: 99%
“…Beispielsweise wurden Elektroden unter Verwendung von niederpotentialer Elektroabscheidung (UPD), Schicht-für-Schicht-Abscheidung (LBL), Kolloidsynthese,A tomlagenabscheidung (ALD) und Moleküllagenabscheidung (MLD) zum konformen Aufschichten dünner Schichten auf ein Substrat hergestellt. [44,45] Die Wahl des Verfahrens hängt vom Grçßenmaßstab der Architektur ab.D er Bottom-up-Ansatz ist die bevorzugte Wahl zur Herstellung nanometergroßer Strukturen. Beim Bottom-up-Ansatz wird die Elektrodenstruktur aus der Dampf-, Flüssigkeits-oder festen Phase über Keimbildung und Wachstum aufgebaut.…”
Section: Syntheseansätzeunclassified