2022
DOI: 10.1007/s11664-021-09266-z
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ALD-Assisted Graphene Functionalization for Advanced Applications

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Cited by 6 publications
(3 citation statements)
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“…ALD-oxide (Atomic Layer Depostion-oxide) is an essential material for the perovskite solar cell (PSC) electron transport layer, organic optoelectronic device encapsulation layer, and TEs dielectric layer. However, due to the surface structure of graphene and the step-covering deposition of ALD, ALD oxides are difficult to deposit on graphene, so it is a challenging task to utilize graphene and ALD-oxide simultaneously [ 34 , 65 , 66 , 67 ]. Accordingly, as shown in Figure 4 , people usually deposited a functional layer before depositing the ALD-oxide on the graphene, which can be a useful aid to the deposition of the ALD-oxide [ 68 ].…”
Section: Graphene Based Te Materialsmentioning
confidence: 99%
“…ALD-oxide (Atomic Layer Depostion-oxide) is an essential material for the perovskite solar cell (PSC) electron transport layer, organic optoelectronic device encapsulation layer, and TEs dielectric layer. However, due to the surface structure of graphene and the step-covering deposition of ALD, ALD oxides are difficult to deposit on graphene, so it is a challenging task to utilize graphene and ALD-oxide simultaneously [ 34 , 65 , 66 , 67 ]. Accordingly, as shown in Figure 4 , people usually deposited a functional layer before depositing the ALD-oxide on the graphene, which can be a useful aid to the deposition of the ALD-oxide [ 68 ].…”
Section: Graphene Based Te Materialsmentioning
confidence: 99%
“…For instance, combined theoretical and experimental investigations [15] showed that the adsorption of the ALD alumina precursor onto pristine graphene was kinetically and thermodynamically unfavorable, leading to nucleation, mainly at defect sites and grain boundaries, and an overall nonuniform coverage. To overcome this obstacle, various graphene pretreatment and functionalization methods have been applied [16], and intensive research has been carried out to optimize the ALD process parameters [17]. Such methods can include the chemical functionalization of graphene with NO 2 and O 3 [18,19], or the deposition of an additional seed [20] or interfacial protective [21] layer.…”
Section: Introductionmentioning
confidence: 99%
“…Because of its superior electrical conductivity [35][36][37], large specific surface area [38,39], excellent mechanical stability, and thermal characteristics [40][41][42], graphene is an attractive contender for electronic applications [43,44]. Combining graphene (support substrate) with other materials, such as metals or metal oxides, results in a hybrid surface with lower contact resistance than single-layer graphene [45,46]. Among the class of non-precious metal catalysts, iron materials represent promising candidates as a co-catalyst for Pt-based electrocatalysts [47][48][49].…”
Section: Introductionmentioning
confidence: 99%