2019 Symposium on VLSI Technology 2019
DOI: 10.23919/vlsit.2019.8776568
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Ag Ionic Memory Cell Technology for Terabit-Scale High-Density Application

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Cited by 9 publications
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“…The size of the device being integrated in a billion scaled VLSI chip is continuously scaled down to a sub-10-nano meter region [1][2]. And thanks to this technology advancement, the total bit density in the VLSI chip has increased up to a Tera-bit scale [3].…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The size of the device being integrated in a billion scaled VLSI chip is continuously scaled down to a sub-10-nano meter region [1][2]. And thanks to this technology advancement, the total bit density in the VLSI chip has increased up to a Tera-bit scale [3].…”
Section: Introductionmentioning
confidence: 99%
“…In this paper, we assumed that the random variables that have such pdf are the values for the six threshold voltages (Vth) for the six MOSFET devices that make up the 1bit cell for the 6Tstatic random access memory (SRAM). Those variations for the random variables are mainly caused by the atomic scaled ion-implantation dose fluctuation and gate-oxide electron trap/de-trap phenomena [4][5][6][7][8][9][10][11] and divided into the two random variations caused by (1) the Random Spatial Variation (RSV) and (2) the Random Temporal Variation (RTV). As a result, the tail length of the minimum operating voltage (VDDMIN) pdf distribution of the SRAM has become spatially and temporally longer [12] because both variations of the RSV and the RTV become larger.…”
Section: Introductionmentioning
confidence: 99%
“…The authors are with the Department of Electrical and Information Technology, Lund University, SE-221 00 Lund, Sweden. M. Borg is also with NanoLund, Lund University 22100 Lund, Sweden (e-mail: saketh_ram.mamidala@eit.lth.se) demonstrated to be promising, using a III-V selector would allow to scale the supply voltage for a constant programming and read-out current while simultaneously suppressing leakage currents [10][11][12]. An optimized III-V VNWFET reported in Kilpi et.…”
Section: Introduction Euromorphic Andmentioning
confidence: 99%
“…Emerging memories such as magnetic random access memory, [1][2][3][4][5] resistive random access memory, [6][7][8][9][10][11][12] ferroelectric random access memory, [13][14][15][16] phase change memory, [17][18][19][20][21][22] and ionic memory [23][24][25] are receiving much attention due to their non-volatility, simple structure, scalability, low power consumption, and high-speed operation. Also, emerging memories are expected to be used for various applications such as storage-class memories, [26][27][28][29][30] embedded memories for microcontrollers unit, 31,32) system on a chip, 32,33) and in-memory computing 34,35) for neuromorphic applications.…”
Section: Introductionmentioning
confidence: 99%