Ag films grown by remote plasma enhanced atomic layer deposition on different substrates

Amusan, Akinwumi A.; Kalkofen, Bodo; Gargouri, Hassan; Wandel, Klauss; Pinnow, C. U.; Lisker, Marco; Burte, Edmund P.

doi:10.1116/1.4936221

Cited by 18 publications

(19 citation statements)

References 24 publications

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“…The results on a detailed study of the composition of the ALD Ag NPs by XPS showed that they contain a small amount of oxygen, carbon, fluorine, and phosphorus in the form of precursor residues. Similar results for ALD coatings were obtained earlier by other researchers [ 16 , 24 , 25 ]. However, the presence of such impurities does not noticeably affect the antibacterial properties of silver [ 34 ].…”

Section: Discussionsupporting

confidence: 91%

“…These data are consistent with the literature data. In most studies on the ALD of silver using Ag(fod)(PEt 3 ), the presence of such impurity elements in a small amount is explained by the residues of incompletely reacted precursor ligands [ 25 ]. For the samples deposited on the titanium support, a noticeable amount of titanium was also found, which indicates that the layer of silver nanoparticles is non-conformal.…”

Section: Resultsmentioning

confidence: 99%

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Antibacterial and Osteogenic Properties of Ag Nanoparticles and Ag/TiO2 Nanostructures Prepared by Atomic Layer Deposition

Nazarov

Ezhov

Yudintceva

et al. 2022

JFB

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The combination of titania nanofilms and silver nanoparticles (NPs) is a very promising material, with antibacterial and osseointegration-induced properties for titanium implant coatings. In this work, we successfully prepared TiO2 nanolayer/Ag NP structures on titanium disks using atomic layer deposition (ALD). The samples were studied by scanning electron microscopy (SEM), X-ray diffraction, X-ray photoelectron spectroscopy (XPS), contact angle measurements, and SEM-EDS. Antibacterial activity was tested against Staphylococcus aureus. The in vitro cytological response of MG-63 osteosarcoma and human fetal mesenchymal stem cells (FetMSCs) was examined using SEM study of their morphology, MTT test of viability and differentiation using alkaline phosphatase and osteopontin with and without medium-induced differentiation in the osteogenic direction. The samples with TiO2 nanolayers, Ag NPs, and a TiO2/Ag combination showed high antibacterial activity, differentiation in the osteogenic direction, and non-cytotoxicity. The medium for differentiation significantly improved osteogenic differentiation, but the ALD coatings also stimulated differentiation in the absence of the medium. The TiO2/Ag samples showed the best antibacterial ability and differentiation in the osteogenic direction, indicating the success of the combining of TiO2 and Ag to produce a multifunctional biocompatible and bactericidal material.

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Section: Discussionsupporting

confidence: 91%

Section: Resultsmentioning

confidence: 99%

Antibacterial and Osteogenic Properties of Ag Nanoparticles and Ag/TiO2 Nanostructures Prepared by Atomic Layer Deposition

Nazarov

Ezhov

Yudintceva

et al. 2022

JFB

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“…The EDS equivalent thickness, the NP size, and the morphological thickness increase linearly with the number of cycles (Figure a,b,d), something that could be attributed to usual island growth. According to the literature, silver films present an island morphology before growing into a film. ,,, This is known as the VW growth mechanism; because of the high surface energy of metals (1.25 J/m 2 for silver), the atoms have a strong affinity with each other instead of adhering to the substrate (0.75 J/m 2 for SiO 2 /Si). The experimental observations in Figure strongly suggest that the growth occurs following the VW growth mode.…”

Section: Results and Discussionmentioning

confidence: 99%

“…The fingerprint is an increase of both the NP size, with irregular shapes, and the gap between islands, with a decrease of their density. 7,12,28,31,32,34 However, the growth mechanism is still little understood at the initial stage of the film synthesis.…”

Section: Methodsmentioning

confidence: 99%

“…Thanks to its low electrical resistivity at low thickness, high thermal conductivity and high reflectance over the whole optical spectra, silver imposes itself as the right material for a number of applications, such as gas sensors, , catalysts, , antimicrobial surfaces, , interconnects in microelectronics (by replacing copper in integrated circuits), optical highly reflective mirrors and decorative coatings, in various fields. Moreover, because of their plasmonic properties, Ag nanoparticles (NPs) are used in functional optical coatings with applications in surface-enhanced Raman scattering, biosensing and plasmon circuitry, coherent light sources, sensors and photovoltaic devices based on localized surface plasmon resonance (SPR) .…”

Section: Introductionmentioning

confidence: 99%

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Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition

et al. 2019

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The control of nanometer-scale metallic silver particles morphology and their functional properties on a large scale represent a key factor for applications such as plasmonics, sensors, catalysts, or antimicrobial surfaces. The present work investigates in detail the growth of Ag nanoparticles deposited by plasma-enhanced atomic layer deposition (PE-ALD), from triethylphosphine(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)silver(I) [Ag(fod)(PEt3)C16H25AgF7O2P] as the Ag precursor and H2 as the reducing agent. The uniformity of the deposition in terms of nanoparticle morphology and chemical composition over a large surface area (8 in.) is analyzed using an original method. For all morphological, crystallographic, and chemical quantities, we report both the value at the center position and more originally, the gradient over a 10 cm distance on the substrate. The evolution of the gradient provides significant information on the growth mechanism. An effective growth rate of 0.020 ± 0.003 nm/cycle at 130 °C determined by energy-dispersive X-ray spectroscopy is found uniformly over the whole 8-inch area of the sample. According to X-ray diffraction and X-ray photoemission spectroscopy performed on the whole silicon wafer, the deposited material is made of polycrystalline pure metallic Ag, with a low amount of impurities emanating from the precursor, showing the completeness of the reduction reaction. Under self-limiting conditions, the effects of the chamber temperature and cycle number on the morphology of Ag nanoparticles deposited on silicon are analyzed. The results suggests that the Ag thin films mainly evolve following a material transfer. Two potential mechanisms are in competition: the migration of the particles and their further coalescence through the Volmer–Weber growth mode or a “surface Ostwald ripening”-like process. Under certain conditions, this last mechanism could explain the nonuniformity of the deposition.

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Silver Thin‐Film Electrodes Grown by Low‐Temperature Plasma‐Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure

Hasselmann

Misimi

Boysen

et al. 2022

Adv Materials Technologies

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The unique properties of atomic layer deposition (ALD) are mainly exploited for metal oxides, while the growth of metals, such as silver, is still in its infancy. Low growth temperatures and high growth rates are essential to achieve conductive (i.e. percolated) films. Here, a study based on the authors’ recently introduced N‐heterocyclic carbene‐based Ag amide precursor [(NHC)Ag(hmds)] (1,3‐di‐tert‐butyl‐imidazolin‐2‐ylidene silver(I) 1,1,1‐trimethyl‐N‐(trimethylsilyl) silanaminide) using plasma‐enhanced spatial ALD at atmospheric pressure and at deposition temperatures as low as 60 °C, is provided. The favorable reactivity and high volatility of the [(NHC)Ag(hmds)] precursor affords high growth rates up to 3.4 × 1014 Ag atoms cm–2 per cycle, which are ≈2.5 times higher than that found with the established triethylphosphine(6,6,7,7,8,8,8‐heptafluoro‐2,2‐dimethyl‐3,5‐octanedionate) silver(I) [Ag(fod)(PEt3)] precursor. Consequently, highly conductive Ag films with resistivities as low as 2.7 µΩ cm are achieved at a deposition temperature of 100 °C with a percolation threshold of ≈2.6 × 1017 Ag atoms cm–2, which is more than 1.6 times lower compared to [Ag(fod)(PEt3)]. As a concept study, conductive Ag layers are used as bottom electrodes in organic solar cells, that achieve the same performance as those based on Ag electrodes resulting from a high vacuum process.

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Ag films grown by remote plasma enhanced atomic layer deposition on different substrates

Cited by 18 publications

References 24 publications

Antibacterial and Osteogenic Properties of Ag Nanoparticles and Ag/TiO2 Nanostructures Prepared by Atomic Layer Deposition

Antibacterial and Osteogenic Properties of Ag Nanoparticles and Ag/TiO2 Nanostructures Prepared by Atomic Layer Deposition

Large-Scale Deposition and Growth Mechanism of Silver Nanoparticles by Plasma-Enhanced Atomic Layer Deposition

Silver Thin‐Film Electrodes Grown by Low‐Temperature Plasma‐Enhanced Spatial Atomic Layer Deposition at Atmospheric Pressure

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