High Gradient Accelerating Structure 2014
DOI: 10.1142/9789814602105_0003
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Advances in the Understanding of the Physical Processes of Vacuum Breakdown

Abstract: Advances in the fundamental understanding of vacuum breakdown achieved during the program to develop high-gradient accelerating structures for a TeV-range linear collider project are described.Presented at: Symposium on High-Gradient Accelerating Structures Beijing, China May 19th, 2013 CLIC -Note -1025 Advances in the Understanding of the Physical Processes of Vacuum BreakdownWalter Wuensch CERN, Geneva, Switzerland.Advances in the fundamental understanding of vacuum breakdown achieved during the program… Show more

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Cited by 13 publications
(11 citation statements)
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“…Conditioning includes both an initial extrinsic process (resulting from the removal of contaminates) and a longterm intrinsic process resulting from modifications of the electrode. In line with our model, this comes about as a result of surface hardening [50]. In addition, by controlling the dislocation mobility, our model offers a direction for improving the electrode performance.…”
supporting
confidence: 74%
“…Conditioning includes both an initial extrinsic process (resulting from the removal of contaminates) and a longterm intrinsic process resulting from modifications of the electrode. In line with our model, this comes about as a result of surface hardening [50]. In addition, by controlling the dislocation mobility, our model offers a direction for improving the electrode performance.…”
supporting
confidence: 74%
“…b) Typical measured current and voltage from the DC spark experiment [60]. Plot reproduced from [61]. Fig.…”
Section: Simulation Results and Discussionmentioning
confidence: 99%
“…The design, manufacture and testing of the prototypes is a well-established process. The limiting gradient behavior has been comprehensively studied and reasonably well understood [3]. In particular, a quantity based on local power flow [4] appears to determine the limiting gradient as a function of rf design for a given manufacturing procedure.…”
Section: Introductionmentioning
confidence: 99%