2020 IEEE 70th Electronic Components and Technology Conference (ECTC) 2020
DOI: 10.1109/ectc32862.2020.00182
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Advances in High Performance RDL Technologies for Enabling IO Density of 500 IOs/mm/layer and 8-μm IO Pitch Using Low-k Dielectrics

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Cited by 19 publications
(2 citation statements)
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“…BEOL RDLs, however, suffer from the disadvantage of higher cost due to smaller wafer-size processing. With recent advances in glass interposers, this issue has now been addressed by providing a panel-sized solution, thus lowering the cost of high-density substrates [13,14]. Additionally, panel-scale processing is critical for the manufacturing of large body-size interposers and substrates, which are less economical at the wafer scale.…”
Section: Fabrication and Processingmentioning
confidence: 99%
“…BEOL RDLs, however, suffer from the disadvantage of higher cost due to smaller wafer-size processing. With recent advances in glass interposers, this issue has now been addressed by providing a panel-sized solution, thus lowering the cost of high-density substrates [13,14]. Additionally, panel-scale processing is critical for the manufacturing of large body-size interposers and substrates, which are less economical at the wafer scale.…”
Section: Fabrication and Processingmentioning
confidence: 99%
“…A wide variety of dielectric materials are studied to meet requirements for desired electrical performance of digital microsystem [ 6 ]. Among them, polyimide is the most widely applied.…”
Section: Introductionmentioning
confidence: 99%