2017
DOI: 10.3762/bjnano.8.200
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Advances and challenges in the field of plasma polymer nanoparticles

Abstract: This contribution reviews plasma polymer nanoparticles produced by gas aggregation cluster sources either via plasma polymerization of volatile monomers or via radio frequency (RF) magnetron sputtering of conventional polymers. The formation of hydrocarbon, fluorocarbon, silicon- and nitrogen-containing plasma polymer nanoparticles as well as core@shell nanoparticles based on plasma polymers is discussed with a focus on the development of novel nanostructured surfaces.

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Cited by 37 publications
(34 citation statements)
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“…This equipment became popular as a gas aggregation cluster source (GAS) . Afterwards, GASes were successfully applied for the production of semiconductor, insulator, and plasma polymer NPs . The application of two or even three magnetrons in the same aggregation chamber enabled the production of heterogeneous NPs.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…This equipment became popular as a gas aggregation cluster source (GAS) . Afterwards, GASes were successfully applied for the production of semiconductor, insulator, and plasma polymer NPs . The application of two or even three magnetrons in the same aggregation chamber enabled the production of heterogeneous NPs.…”
Section: Introductionmentioning
confidence: 99%
“…[1,2] Afterwards, GASes were successfully applied for the production of semiconductor, insulator, and plasma polymer NPs. [3][4][5][6] The application of two or even three magnetrons in the same aggregation chamber [7,8] enabled the production of heterogeneous NPs. In spite of the huge number of studies that dealt with the gas phase preparation of metal NPs and their applications, [9][10][11][12][13][14][15][16] little concern has been raised with regard to the processes occurring inside the aggregation chamber.…”
mentioning
confidence: 99%
“…Under given conditions, fluxes of 1 μm −2 ·min −1 of C:H particles and 370 μm −2 ·min −1 of Cu NPs were produced. More details about the synthesis of the C:H and Cu NPs can be found elsewhere …”
Section: Methodsmentioning
confidence: 99%
“…In analogy to “conventional” magnetron sputtering, magnetron-based GAS systems were initially employed generally for the production of various metallic (e.g., Ag [69,70,71], Cu [72,73], Al [74], Ti [75,76,77], Co [78,79], Pt [80,81], Nb [82], Pd [83], W [84], Ni [85], Ru [86]) and metal-oxide NPs [87,88]. However, our group recently showed that GAS systems may also be easily adapted for the production of plasma polymer NPs if the polymeric target is sputtered in the RF mode [89,90,91,92,93].…”
Section: Introductionmentioning
confidence: 99%