Magnetron discharge in a cold buffer gas represents a liquid-free approach to the synthesis of metal nanoparticles (NPs) with tailored structure, chemical composition and size. Despite a large number of metal NPs that were successfully produced by this method, the knowledge of the mechanisms of their nucleation and growth in the discharge is still limited, mainly because of the lack of in situ experimental data. In this work, we present the results of in situ Small Angle X-ray Scattering measurements performed in the vicinity of a Cu magnetron target with Ar used as a buffer gas. Condensation of atomic metal vapours is found to occur mainly at several mm distance from the target plane. The NPs are found to be captured preferentially within a region circumscribed by the magnetron plasma ring. In this capture zone, the NPs grow to the size of 90 nm whereas smaller ones sized 10-20 nm may escape and constitute a NP beam. Time-resolved measurements of the discharge indicate that the electrostatic force acting on the charged NPs may be largely responsible for their capturing nearby the magnetron.

Kinetic aspects of the synthesis of Ag nanoparticles (NPs) by magnetron sputtering are studied by in situ and time‐resolved small angle X‐ray scattering (SAXS). Part of the NPs are found to become confined within a capture zone at 1–10 mm from the surface of the target and circumscribed by the plasma ring. Three regimes of the NP growth are identified: 1) early growth at which the average NP diameter rapidly increases to 90 nm; 2) cycling instabilities at which the SAXS signal periodically fluctuates either due to expelling of large NPs from the capture zone or due to the axial rotation of the NP cloud; and 3) steady‐state synthesis at which stable synthesis of the NPs is achieved. The NP confinement within the capture zone is driven by the balance of forces, the electrostatic force being dominant. On reaching the critical size, large NPs acquire an excessive charge and become expelled from the capture zone via the electrostatic interactions. As a result, significant NP deposits are formed on the inner walls of the aggregation chamber as well as in the central area of the target.

Titanium nanocluster films were prepared using a gas aggregation cluster source based on a planar magnetron following a Haberland concept and using Ar as a working gas. The films were deposited in dependence on the argon pressure inside the cluster source and on the magnetron current. Prior to the analysis, deposited metal nanocluster films were allowed to oxidize in air at room temperature. Selected nanocluster films were annealed in air at 420 °C. The films were studied by TEM, SEM, and AFM in order to describe their morphology and topography. Crystal structure of the nanoclusters was estimated from electron diffraction patterns by SAD analysis. Chemical composition of the film surface was determined by XPS. Special attention was paid to describing the changes in the nanocluster films connected with ageing.

Nylon-sputtered nanoparticles were prepared using a simple gas aggregation cluster source based on a planar magnetron (Haberland type) and equipped with a nylon target. Plasma polymer particles originated in an aggregation chamber and travelled to a main (deposition) chamber with a gas flow through an orifice. The deposited nanoparticles were observed to have a cauliflower-like structure. The nanoparticles were found to be nitrogen-rich with N/C ratio close to 0.5. An increase in rf power from 60 to 100 W resulted in a decrease in mean particle size from 210 to 168 nm whereas an increase in their residence time in the cluster source from 0.7 to 4.6 s resulted in an increase in the size from 73 to 231 nm.