Advancements in predictive plasma formation modeling

Purvis, Michael; Schafgans, A. A.; Brown, Daniel J.; Fomenkov, Igor V.; Rafac, Rob; Brown, J.L.; Tao, Y.; Rokitski, Slava; Abraham, Mathew C.; Vargas, Mike; Rich, Spencer; Taylor, Ted; Brandt, David C.; Pirati, Alberto; Fisher, Aaron; Scott, H. A.; Koniges, Alice; Eder, David C.; Wilks, S. C.; Link, A.; Langer, Steven H.

doi:10.1117/12.2221991

Cited by 9 publications

(4 citation statements)

References 4 publications

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“…This can cause plasma engineering efforts to be incremental instead of transformative in support of higher-volume manufacturing. In the past, industry-government laboratory partnerships have sought to understand and thus control the plasma process and have reported their successes [47]. Simulation experts from industry also noted how the complex simulation covers multiple physics domains across varied time scales.…”

Section: Plasma Physics and Modeling: Light-matter Interactionmentioning

confidence: 99%

Report from the Extreme Ultraviolet (EUV) Lithography Working Group Meeting :

Rasmussen

2023

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This is the report of a hybrid working group meeting held on April 25, 2023, at the National Institute of Standards and Technology (NIST) in Boulder, CO. The working group was focused on extreme ultraviolet lithography (EUVL) research, development, and manufacturing. The meeting allowed for productive discussions on many technical aspects of EUVL. Industry participants gave presentations that helped inform this report's outline of the current state of the science, challenges, needs, and future opportunities for accelerated innovation in EUVL. The report also includes information on some of NIST's efforts that could begin or continue to support the USA semiconductor industry. Cohesively presenting some of NIST's research and capabilities at the working group meeting provided external stakeholders visibility and the opportunity to comment. The meeting was insightful for industry participants learning about NIST's research capabilities .In turn, NIST researchers gained a deeper understanding of the industry's needs to identify where NIST's metrology expertise could assist in EUVL research. The meeting and this report do not, and are not intended to, capture the entire perspective of the EUVL industry but rather serve as a discussion starting point. Future work includes expanding participation, honing NIST research sub-groups to specific needs of EUVL, and executing priority research discussed in the working group meeting or any future meetings. Through engagement with the USA EUVL industry, targeted research collaborations are hoped to be created, accelerating semiconductor manufacturing innovation and generating meaningful value for USA taxpayers.

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Section: Plasma Physics and Modeling: Light-matter Interactionmentioning

confidence: 99%

Report from the Extreme Ultraviolet (EUV) Lithography Working Group Meeting :

Rasmussen

2023

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“…Current lithography tools use high power excimer lasers, however, direct scaling of laser technology to EUV wavelengths is not feasible from the perspective of use in exposure tools. High volume production EUV sources a based on laser-produced plasmas [20][21][22]. Not only must EUV sources produce high power, but they must do it in a clean manner making debris mitigation another crucial issue for the source.…”

Section: Sourcementioning

confidence: 99%

Optical Lithography

Naulleau¹

2019

Comprehensive Nanoscience and Nanotechnology

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“…Examples include the elucidation of EUV generation in laser-driven tin plasmas [17][18][19][20][21][22][23], the characterization of tin-plasma properties [24][25][26][27][28][29][30] as well as the identification of experimental conditions (laser parameters, tin target structures, etc.) that optimize the working conditions of the light source [31][32][33][34][35][36]. Looking to the future and the need to develop more powerful EUV sources (beyond the current 250 W of in-band EUV power [37]) will require (i) new, fundamental insights on EUV generation from complex target structures [34] and (ii) exploring the plasma physics implications of alternate drive-laser concepts, e.g., the use of a Thulium-based 2-µm-wavelength drive laser [38][39][40][41][42].…”

Section: Introductionmentioning

confidence: 99%

“…that optimize the working conditions of the light source [31][32][33][34][35][36]. Looking to the future and the need to develop more powerful EUV sources (beyond the current 250 W of in-band EUV power [37]) will require (i) new, fundamental insights on EUV generation from complex target structures [34] and (ii) exploring the plasma physics implications of alternate drive-laser concepts, e.g., the use of a Thulium-based 2-µm-wavelength drive laser [38][39][40][41][42].…”

Section: Introductionmentioning

confidence: 99%

Review of the 1st EUV Light Sources Code Comparison Workshop

Sheil,

Versolato,

Bakshi

et al. 2023

Atoms

Self Cite

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We review the results of the 1st Extreme Ultraviolet (EUV) Light Sources Code Comparison Workshop. The goal of this workshop was to provide a platform for specialists in EUV light source plasma modeling to benchmark and validate their numerical codes using well-defined case studies. Detailed consideration of a plethora of atomic collisional and radiative processes is required for modeling EUV light source plasmas. Eight institutions spanning four countries contributed data to the workshop. Two topics were addressed, namely (i) the atomic kinetics and radiative properties of tin plasmas under EUV-generating conditions and (ii) laser absorption in a fully ionized, one-dimensional hydrogen plasma. In this paper, we summarize the key findings of the workshop and outline plans for future iterations of the code comparison activity.

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Advancements in predictive plasma formation modeling

Cited by 9 publications

References 4 publications

Report from the Extreme Ultraviolet (EUV) Lithography Working Group Meeting :

Report from the Extreme Ultraviolet (EUV) Lithography Working Group Meeting :

Optical Lithography

Review of the 1st EUV Light Sources Code Comparison Workshop

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