Advanced Process Monitoring and Control Methods for Poly Gate CD Targeting

Underwood, J.; Gray, J.O.; Shepherd, N.H.; Caldwell, M.; Néel, Marie-Christine; Darlington, B.

doi:10.1109/asmc.2006.1638718

Cited by 4 publications

(2 citation statements)

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“…Advanced process control (APC) systems improve the electrical performance of devices by reducing the random CD and profile variation induced during predominant process steps. Real-time control loops feed in-line CD and profile data to gate lithography, gate etch, and downstream processes (implant and anneal) to reduce Lef, variations and improve Leff targeting [6]. Figure 4 shows a 30% improvement in wafer mean gate CD variation due to metrology-driven APC improvements.…”

Section: Importance Of Metrologymentioning

confidence: 94%

The ROI of Metrology

Bunday¹,

Allgair

Caldwell³

et al. 2006

2006 IEEE International Symposium on Semiconductor Manufacturing

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The conventional premise that metrology is a is the result of the metrology team executing its job correctly "non-value-added necessary evil" is a misleading one, which and thoroughly. mufst he viewed as obsolete thinking. Much oJf the metrololQv requirements are now key enablers to traditionally labeled "value-added" processing steps in lithography and etch, such that they can be considered integral parts ofthe processes. This paper will explore the present and future trends and challenges in CD metrology. However, equipment is only part of the battle. The quality application of these tools in a production environment is quite important; the ultimate valueadded by metrology is a result ofquality tools run by a quality metrology team using quality practices.

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Section: Importance Of Metrologymentioning

confidence: 94%

The ROI of Metrology

Bunday¹,

Allgair

Caldwell³

et al. 2006

2006 IEEE International Symposium on Semiconductor Manufacturing

View full text Add to dashboard Cite

show abstract

“…APC systems improve the electrical performance of devices by reducing the random CD and profile variation induced during predominant process steps. Real-time control loops feed inline CD and profile data to gate lithography, gate etch, and downstream processes (implant and anneal) to reduce variations and improve targeting [6]. In fact, APC is a fundamentally new concept that gives metrology a key role in determining the quality of the final product.…”

Section: Advanced Process Control (Apc)mentioning

confidence: 99%

Value-Added Metrology

Bunday¹,

Allgair²,

Caldwell³

et al. 2007

IEEE Trans. Semicond. Manufact.

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The conventional premise, long-touted among the semiconductor processing community, that metrology is a "non-value-added necessary evil," is a misleading and dangerous assertion, which must be viewed as obsolete thinking. Many metrology applications are key enablers to traditionally labeled "value-added" processing steps in lithography and etch, such that they can be considered integral parts of the processes.Various key trends in modern, state-of-the-art processing such as optical proximity correction, design for manufacturability, and advanced process control are based, at their hearts, on the assumption of fine-tuned metrology, in terms of uncertainty and accuracy. These trends are vehicles where metrology thus has large opportunities to create value through the engineering of tight and targetable process distributions. Such distributions make possible predictability in speed-sorts and in other parameters, which results in a high-end product. Additionally, significant reliance has also been placed on defect metrology to predict, improve, and reduce yield variability. The necessary quality metrology is strongly influenced by not only the choice of equipment, but also the quality application of these tools in a production environment. The ultimate value added by metrology is a result of quality tools run by a quality metrology team using quality practices. This paper will explore the relationships among present and future trends and challenges in metrology, including equipment, key applications, and metrology deployment in the manufacturing flow. Of key importance are metrology personnel, with their expertise, practices, and metrics in achieving and maintaining the required level of metrology performance, including where precision, matching, and accuracy fit into these considerations. The value of metrology will be demonstrated to have shifted to being a "key enabler of large revenues," debunking the out-of-date premise that metrology is "non-value-added." Index Terms-Advanced process control (APC), critical dimension (CD), design-based metrology (DBM), design for manufacturability (DFM), ISMI, metrology, optical proximity correction (OPC).

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In-Line Process Window Monitoring using Voltage Contrast Inspection

Patterson

Kang

et al. 2008

2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference

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Advanced Process Monitoring and Control Methods for Poly Gate CD Targeting

Cited by 4 publications

References 0 publications

The ROI of Metrology

The ROI of Metrology

Value-Added Metrology

In-Line Process Window Monitoring using Voltage Contrast Inspection

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