Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials

Niinist�, Lauri; P�iv�saari, J.; Niinist�, J.; Putkonen, Matti; Nieminen, Minna

doi:10.1002/pssa.200406798

Cited by 326 publications

(173 citation statements)

References 62 publications

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“…It is believed by the authors that the ALD/FIB technique has the potential to push these boundaries in the future. From a fabrication point of view, both alumina (Niinistö et al, 2004) and iridium (Aaltonen et al, 2004) can be deposited via established ALD routes. It is also worth noting that t Optimum of all above-mentioned Al 2 O 3 /Ir ML-FZPs are of the order of only a few micrometers, which would help in reducing the impact of the previously mentioned effect of structural error accumulation in propagation direction as thickness increases.…”

Section: Materials Selection and Performance Expectations For Future mentioning

confidence: 99%

Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling

Mayer

Keskinbora

Grévent

et al. 2013

J Synchrotron Radiat

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Fresnel zone plates (FZPs) recently showed significant improvement by focusing soft X-rays down to ∼10 nm. In contrast to soft X-rays, generally a very high aspect ratio FZP is needed for efficient focusing of hard X-rays. Therefore, FZPs had limited success in the hard X-ray range owing to difficulties of manufacturing high-aspect-ratio zone plates using conventional techniques. Here, employing a method of fabrication based on atomic layer deposition (ALD) and focused ion beam (FIB) milling, FZPs with very high aspect ratios were prepared. Such multilayer FZPs with outermost zone widths of 10 and 35 nm and aspect ratios of up to 243 were tested for their focusing properties at 8 keV and shown to focus hard X-rays efficiently. This success was enabled by the outstanding layer quality thanks to ALD.Viathe use of FIB for slicing the multilayer structures, desired aspect ratios could be obtained by precisely controlling the thickness. Experimental diffraction efficiencies of multilayer FZPs fabricatedviathis combination reached up to 15.58% at 8 keV. In addition, scanning transmission X-ray microscopy experiments at 1.5 keV were carried out using one of the multilayer FZPs and resolved a 60 nm feature size. Finally, the prospective of different material combinations with various outermost zone widths at 8 and 17 keV is discussed in the light of the coupled wave theory and the thin-grating approximation. Al2O3/Ir is outlined as a promising future material candidate for extremely high resolution with a theoretical efficiency of more than 20% for as small an outermost zone width as 10 nm at 17 keV.

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Section: Materials Selection and Performance Expectations For Future mentioning

confidence: 99%

Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling

Mayer

Keskinbora

Grévent

et al. 2013

J Synchrotron Radiat

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“…ALD is a thermally activated gas phase process for synthesizing thin solid films by sequentially exposing an object to a series of two or more gaseous reactants, each of which undergoes self-limiting chemisorption surface reactions [19][20][21]. A sample is placed into the ALD vacuum chamber and heated (experimental details of ALD deposition can be found in the section "Methods").…”

Section: Introductionmentioning

confidence: 99%

Protecting silver cultural heritage objects with atomic layer deposited corrosion barriers

et al. 2015

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Introduction: Silver, prized throughout history for its luster and shine, develops a black Ag 2 S tarnish layer that is aesthetically displeasing when exposed to atmospheric pollutants. Tarnishing, and subsequent polishing, leads to irreversible material loss and object damage. Currently, nitrocellulose coatings are often used to prevent silver from tarnishing, however non-uniform coatings and degradation over time limit their effectiveness. Atomic layer deposition (ALD) has been explored as a new method for creating dense, uniform, and conformal coatings on 3-dimensional (3D) objects that are more effective than nitrocellulose in preventing silver from tarnishing. Results:To create high quality ALD coatings on 3D objects, slowing down the ALD process is critical to ensure proper precursor exposure. Non-ideal deposition of organo-oxy-metallic compounds can occur with fast deposition rates that do not allow sufficient flow around 3D objects. The coatings can be removed by dissolving the Al 2 O 3 ALD films in aqueous NaOH. Thicker ALD films prevent defects from occurring on non-ideal surfaces and effectively prevent silver objects from tarnishing under ambient aging conditions. Conclusion:Thick ALD films, deposited with sufficiently long precursor pulse and purge times, may be effective in preventing complex, 3D non-mixed media silver cultural heritage objects from tarnishing.

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“…23 these merits, the most attractive advantage for ALD to be used in modifying track-etched nanopores is its accurate and straightforward control of the thickness of the deposited films. In this work, we demonstrate a new type of devices with ALD modified polymer nanopores.…”

Section: Introductionmentioning

confidence: 99%

Fabrication of nanofluidic diodes with polymer nanopores modified by atomic layer deposition

Sheng

Wang

et al. 2014

Biomicrofluidics

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Surface charge distribution is a crucial factor for the ionic transport properties inside nanopores. Modifying the surface charge inside a single conical nanopore can greatly affect the rectification behavior of the ionic current through the nanopore and afford nanofluidic diodes. In this work, we describe a new method to fabricate nanofluidic diodes by atomic layer deposition (ALD) on conical tracketched nanopores. Thorough investigation of the ionic transport behavior through ALD-modified polyethylene terephthalate (PET) nanopores is carried out. Our results demonstrate that ALD is a simple and effective method to modify the inner surface of the polymer nanopores for fabricating nanofluidic devices. In addition, we also investigate the stability of the ALD-modified nanopores, and the results suggest that the long-time stability could be compromised by high voltage applied along the nanopore. V C 2014 AIP Publishing LLC.

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Advanced electronic and optoelectronic materials by Atomic Layer Deposition: An overview with special emphasis on recent progress in processing of high-k dielectrics and other oxide materials

Cited by 326 publications

References 62 publications

Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling

Efficient focusing of 8 keV X-rays with multilayer Fresnel zone plates fabricated by atomic layer deposition and focused ion beam milling

Protecting silver cultural heritage objects with atomic layer deposited corrosion barriers

Fabrication of nanofluidic diodes with polymer nanopores modified by atomic layer deposition

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