2002
DOI: 10.1116/1.1520570
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Advanced die-to-database inspection technique for embedded attenuated phase shift mask

Abstract: We have developed a deep ultraviolet die-to-database inspection system MC-3500 for the 130 nm node and beyond. The system involves comparison of a mask image scanned at a wavelength of 257 nm and a reference data calculated from complex amplitude of objects with 200 Mpixel/s throughput. An approximation of Hopkins formulation in the region of a large partial coherence factor gives a nonlinear filtering scheme for embedded attenuated phase shift mask ͑EPSM͒. The nonlinear filtering was evaluated for intensity f… Show more

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