Proceedings of the 13th International Symposium on Power Semiconductor Devices &Amp; ICs. IPSD '01 (IEEE Cat. No.01CH37216)
DOI: 10.1109/ispsd.2001.934647
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Advanced 60 μm thin 600 V punch-through IGBT concept for extremely low forward voltage and low turn-off loss

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Cited by 16 publications
(6 citation statements)
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“…Fig. 8 compares V CE -V BD performance of different state-of-the-art technologies [7,15]. To have a fair comparison, all the forward voltages are read under the same current density, J CE = 150 A/cm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…Fig. 8 compares V CE -V BD performance of different state-of-the-art technologies [7,15]. To have a fair comparison, all the forward voltages are read under the same current density, J CE = 150 A/cm 2 .…”
Section: Resultsmentioning
confidence: 99%
“…The lower the rated voltage is, the thinner the wafer thickness is. The TWP approach started with 1200 V class devices from the process easiness point of view and currently has reached around 600 V [12][13][14][15][16] and 400 V classes [17]. Considering movements to larger diameter wafers for power devices, it is obvious that TWP is one of the key technologies.…”
Section: Improving Fundamental Trade-offmentioning
confidence: 99%
“…Some examples are 600-V IGBT structures by the Fuji Electric Company [23] and Toshiba Corporation [24]; 1200-V IGBT structures by Fairchild Semiconductor [25]; and 6500-V IGBTs by the ABB Semiconductors Limited [26]. Some examples are 600-V IGBT structures by the Fuji Electric Company [23] and Toshiba Corporation [24]; 1200-V IGBT structures by Fairchild Semiconductor [25]; and 6500-V IGBTs by the ABB Semiconductors Limited [26].…”
Section: Power Loss Trade-off Curvesmentioning
confidence: 99%