2007
DOI: 10.1063/1.2402961
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Admittance spectroscopy of CdTe∕CdS solar cells subjected to varied nitric-phosphoric etching conditions

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Cited by 34 publications
(28 citation statements)
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“…In contrast, the capacitance response from E a2 is bias independent (Figure c), which suggests that the charged defects contributing to the carrier transport are located in the bulk of the CdTe absorber. The HI‐etching leads to Te enrichment at GBs and a drop in GB resistance ( R GB ), which restrains the response of the bulk defects . Additionally, the capacitive properties of GBs may also be changed by additional doping and the electrical field of the depletion region, when the amount of enriched Te is large.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…In contrast, the capacitance response from E a2 is bias independent (Figure c), which suggests that the charged defects contributing to the carrier transport are located in the bulk of the CdTe absorber. The HI‐etching leads to Te enrichment at GBs and a drop in GB resistance ( R GB ), which restrains the response of the bulk defects . Additionally, the capacitive properties of GBs may also be changed by additional doping and the electrical field of the depletion region, when the amount of enriched Te is large.…”
Section: Resultsmentioning
confidence: 99%
“…Wet‐chemical etching has been widely used to produce such a Te‐rich surface as well as to remove various oxides and/or chlorides that may form at the CdTe surface during device processing, such as the cadmium chloride (CdCl 2 ) mediated heat treatment procedure that is used to improve the electronic quality of the CdTe material. A variety of etching agents have been used to fabricate efficient CdTe solar cells, including nitric/phosphoric‐based acid (NP), potassium dichromate sulfuric acid (KD), and bromine in methanol (BM) . However, these etching agents contain toxic and/or hazardous materials which are not desirable due to manufacturing safety concerns.…”
Section: Introductionmentioning
confidence: 99%
“…6,12,13 ͑It is important to note that according to Ref. 2 and 3, respectively, several important observations can be made.…”
mentioning
confidence: 94%
“…6 Figure 1͑a͒ shows the capacitance-voltage data on a Mott-Schottky plot for samples 156 and 173, and Fig. The efficiency of this sample is = 9%, and open circuit voltage V oc = 0.6 V. For sample 156, no ZnO buffer layer was grown between ITO and CdS ͑ = 7.3% and V oc = 0.57 V͒.…”
mentioning
confidence: 99%
“…18 These states were self-consistently incorporated into the total equivalent circuit of the device in dark. 1 The number of such deep states, however, can be arbitrary and depends on the sample growth and processing conditions.…”
Section: B Recombination and Carrier Trapping In Cdte Absorber Layersmentioning
confidence: 99%