2002
DOI: 10.1063/1.1434951
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Activated dissociation via a trapping precursor: O2/Cu(001)-(2√×√)-O

Abstract: Dissociative adsorption of O2 on Cu(001)-(2√×√)-O was shown to induce Cu2O epitaxial islands on the surface. The initial dissociative sticking probability of O2 on Cu(001)-(2√×√)-O scaled with the total translational energy of incident O2, suggesting that the interaction potential was highly corrugated. The sticking probability decreased with increasing translational energy of incidence and increased with increasing surface temperature. For lower translational energy of incident O2 (⩽130 meV), the velocity dis… Show more

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Cited by 16 publications
(23 citation statements)
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“…There are several experimental studies concerning this subject, [2][3][4][5] but only a few theoretical studies, 6,7 especially those related to the adsorption dynamics in the case of the oxygen induced, ͑2 ͱ 2 ϫ ͱ 2͒R45°-O reconstruction of Cu͑100͒. This reconstruction is observed to occur as the oxygen concentration on the Cu͑100͒ surface exceeds 0.34 ML ͑monolayer͒, 8,9 and it is due to the long-range Coulomb interaction between the on-surface oxygen atoms.…”
Section: Introductionmentioning
confidence: 99%
“…There are several experimental studies concerning this subject, [2][3][4][5] but only a few theoretical studies, 6,7 especially those related to the adsorption dynamics in the case of the oxygen induced, ͑2 ͱ 2 ϫ ͱ 2͒R45°-O reconstruction of Cu͑100͒. This reconstruction is observed to occur as the oxygen concentration on the Cu͑100͒ surface exceeds 0.34 ML ͑monolayer͒, 8,9 and it is due to the long-range Coulomb interaction between the on-surface oxygen atoms.…”
Section: Introductionmentioning
confidence: 99%
“…Cu͑100͒ is reactive towards O 2 dissociation, and adsorption of O 2 and oxide formation have been extensively investigated on it by a wide array of techniques: low-energy electron diffraction ͑LEED͒, 8 scanning tunneling microscopy ͑STM͒/LEED, 9-16 molecular beam surface scattering ͑MBSS͒/reflection highenergy electron diffraction ͑RHEED͒/Auger electron spectroscopy ͑AES͒/thermal desorption mass spectrometry ͑TDMS͒/LEED, 17,18 surface stress change by crystal curvature technique/density functional theory ͑DFT͒/LEED, 19 LEED multiple-scattering analysis, 20 time-resolved verylow-energy electron diffraction ͑VLEED͒, 21 spot profile analysis low-energy electron diffraction/helium diffraction ͑HED͒, 22 high-resolution electron energy-loss spectroscopy ͑HREELS͒/LEED/AES, 23 HREELS/x-ray photoelectron spectroscopy ͑XPS͒, [24][25][26] hyperthermal O 2 molecular beam ͑HOMB͒/XPS, 27,28 near edge x-ray absorption fine structure ͑NEXAFS͒, 29 normal-emission photoelectron diffraction/NEXAFS/LEED, 30 surface-extended x-ray absorption fine structure ͑SEXAFS͒, 31 angle-and temperaturedependent SEXAFS, 32 angle-dependent NEXAFS and SEXAFS/LEED/XPS/AES/TDMS, 33 surface x-ray diffraction, 34 in situ synchrotron x-ray scattering, 35 transmission electron microscopy ͑TEM͒, [36][37][38][39][40][41][42][43][44][45] analytical electron microscopy ͑AEM͒, 46,47 and ab initio calculations. [48][49][50][51][52]…”
Section: Introductionmentioning
confidence: 99%
“…An O 2 beam with a narrow distribution of kinetic energy was used in this experiment using a supersonic molecular-beam technique. 8 The O 2 beam at the sample position was 2.5 mm in diameter. The samples used were Si͑001͒ wafers ͑B-doped p-type, 1 -10 ⍀ cm, 8 ϫ 28ϫ 0.5 mm 3 ͒ miscut by Ͻ0.5°to the ͑001͒ plane along the ͓110͔ direction.…”
Section: Methodsmentioning
confidence: 99%