Accurate dimensional characterization of periodic structures by spectroscopic Mueller polarimetry

Martino, A. De; Cattelan, Denis; Bogeat, F.; Licitra, C.; Foucher, J.; Barritault, Pierre; Hazart, J.

doi:10.1117/12.804682

Cited by 9 publications

(10 citation statements)

References 11 publications

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“…5 may provide realistic estimates of the confidence interval giving direct information about the accuracy of the results. The essential conclusion of our work is that the 3D-AFM values mostly fall into the confidence intervals provided by the optical method (tested on 21 different grating boxes), which means that we can estimate the accuracy of our results without using direct comparison with another, non-optical, method [10]. Moreover, this approach may provide a way to improve the accuracy of the grating profile modeling by minimizing the standard deviations evaluated from multiple-azimuths results.…”

Section: Multi-azimuth Spectrally Resolved Mueller Matrix Polarimetrymentioning

confidence: 85%

“…In order to improve the correspondence of the model with real gratings, more parameters has to be included (providing more complex profiles). Introducing more profile parameters, on the other hand, negatively influences correlations between parameters and increases dependence of the results on the initial guess [6]. Further statistical analysis of the azimuth-dependent dimensional parameters from Fig.…”

Section: Multi-azimuth Spectrally Resolved Mueller Matrix Polarimetrymentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

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Profile characterization of diffraction gratings using angle-resolved polarimetric measurements

Martino

Licitra

Foucher

et al. 2010

EPJ Web of Conferences

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Abstract. Development of the characterization tools and techniques used by semi-conductor industry directs not only towards increasing of the instrumental precision, to push limits of the optical characterization methods to the smallest lines, but also towards a decreased dependency of the used tools on the tool-to-tool calibration procedures. The challenge approached in this work is to use multiple independent optical configurations to determine overall accuracy of the results with minimal or no assistance of the other non-optical methods. The approach presented here is based on a well-known change of sensitivity of the optical model parameters at the different azimuthal measurement configurations. The full potential of this method can only be unlocked using complete Mueller matrix measurements providing complete information on the anisotropic nature of the gratings. The measurements at multiple azimuth configurations, used in this work, illustrate the potential of the method on the experimental data provided by the angle-resolved and spectrally resolved Mueller matrix polarimetric tools. The results are consistent with the single-line AFM measurements used as an independent reference.

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Section: Multi-azimuth Spectrally Resolved Mueller Matrix Polarimetrymentioning

confidence: 85%

Section: Multi-azimuth Spectrally Resolved Mueller Matrix Polarimetrymentioning

confidence: 98%

Section: Introductionmentioning

confidence: 99%

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Profile characterization of diffraction gratings using angle-resolved polarimetric measurements

Martino

Licitra

Foucher

et al. 2010

EPJ Web of Conferences

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“…The number of free parameters is closely related to the correlations between them: increasing the number of parameters over a certain threshold usually significantly increases their correlations [6], [11]. Increased correlations between parameters complicate optimization process, which may provide significantly higher error estimates, different values of parameters or it can cause the appearance of the new local minima in close proximity to each other.…”

Section: Modelingmentioning

confidence: 98%

“…One possible method to specify the accuracy of the model is to compare and/or combine different measurement configurations. For the gratings considered here, the simplest way to achieve this is to rotate the sample and measure the grating in different, conical, configurations, which provide new and independent information about the structure [5]- [6]. Combination of the multiple measured data within one fit leads to the best estimation of the parameters according to all available data, but again, it does not provide information about the accuracy of the result.…”

Section: Introductionmentioning

confidence: 97%

Robust characterization of small grating boxes using rotating stage Mueller matrix polarimeter

2010

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In this paper we demonstrate the robustness of the Mueller matrix polarimetry used in multiple-azimuth configuration. We first demonstrate the efficiency of the method for the characterization of small pitch gratings filling 250 µm wide square boxes. We used a Mueller matrix polarimeter directly installed in the clean room has motorized rotating stage allowing the access to arbitrary conical grating configurations. The projected beam spot size could be reduced to 60x25 µm, but for the measurements reported here this size was 100x100 µm. The optimal values of parameters of a trapezoidal profile model, acquired for each azimuthal angle separately using a non-linear least-square minimization algorithm, are shown for a typical grating. Further statistical analysis of the azimuth-dependent dimensional parameters provided realistic estimates of the confidence interval giving direct information about the accuracy of the results. The mean values and the standard deviations were calculated for 21 different grating boxes featuring in total 399 measured spectra and fits. The results for all boxes are summarized in a table which compares the optical method to the 3D-AFM. The essential conclusion of our work is that the 3D-AFM values always fall into the confidence intervals provided by the optical method, which means that we have successfully estimated the accuracy of our results without using direct comparison with another, non-optical, method. Moreover, this approach may provide a way to improve the accuracy of grating profile modeling by minimizing the standard deviations evaluated from multiple-azimuths results.

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Ellipsometry at the Nanoscale

Losurdo¹,

Hingerl²

2013

119

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Accurate dimensional characterization of periodic structures by spectroscopic Mueller polarimetry

Cited by 9 publications

References 11 publications

Profile characterization of diffraction gratings using angle-resolved polarimetric measurements

Profile characterization of diffraction gratings using angle-resolved polarimetric measurements

Robust characterization of small grating boxes using rotating stage Mueller matrix polarimeter

Ellipsometry at the Nanoscale

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