Accumulation of Deuterium and Helium in Co-Deposited W Layers Formed in He-Seeded Deuterium Plasma

The electrical parameters of a high-power impulse magnetron sputtering (HiPIMS) discharge operating in H<sub>2</sub>/He mixtures were studied using different values of the pulse width, repetition frequency, and power. Deposition of tungsten (W) coatings was carried out in a magnetron discharge with a thermally insulated W target in two regimes at different pulse widths (80 and 500 µs) and frequencies (2 and 0.5 kHz). The average discharge power was fixed at P<sub>d</sub> = 1500 W. Fusion-relevant molecular deuterium/helium (He) and hydrogen/He gas mixtures with a 90/10 flow ratio were used in the experiments.

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Accumulation of Deuterium and Helium in Co-Deposited W Layers Formed in He-Seeded Deuterium Plasma

Cited by 3 publications

References 15 publications

Effect of helium presence on tungsten-deuterium co-deposited films

Effect of helium presence on tungsten-deuterium co-deposited films

Studying the Effect of the Parameters of the Fluoride Process of Depositing Tungsten on the Properties of Tungsten Self-Composites Obtained via Chemical Vapor Infiltration

Magnetron Sputter Deposition of Tungsten Coatings in Deuterium-Helium Mixtures

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