The electrical parameters of a high-power impulse magnetron sputtering (HiPIMS) discharge operating in H<sub>2</sub>/He mixtures were studied using different values of the pulse width, repetition frequency, and power. Deposition of tungsten (W) coatings was carried out in a magnetron discharge with a thermally insulated W target in two regimes at different pulse widths (80 and 500 µs) and frequencies (2 and 0.5 kHz). The average discharge power was fixed at P<sub>d</sub> = 1500 W. Fusion-relevant molecular deuterium/helium (He) and hydrogen/He gas mixtures with a 90/10 flow ratio were used in the experiments.
Porous tungsten coatings were prepared by magnetron deposition in He environment. The depositions were carried out in HiPIMS mode with a frequency of 1 kHz and a pulse duration of 300 μs. The tungsten target was thermally insulated from the water-cooled cathode. The samples were mounted on three different distances from the target. Temperature of each sample was measured with a dedicated thermocouple and recorded throughout the deposition process. The structure of resulting W-fuzz layers is analyzed and discussed. The deposition rate of tungsten fuzz in a hot-target magnetron system operated in HiPIMS mode is shown to be ~100 nm/min.
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