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1996
DOI: 10.1063/1.116748
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Above band gap absorption spectra of the arsenic antisite defect in low temperature grown GaAs and AlGaAs

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Cited by 43 publications
(22 citation statements)
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References 9 publications
(11 reference statements)
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“…One possible mechanism noted in the literature [10,6] is the thermal shift of the bandgap leading to a higher absorption coefficient at a given wavelength. Absorption data for LT-GaAs over a wide energy range were measured in [19]. From these data a value of 17000/cm for the absorption coefficient of annealed LT-GaAs at 780 nm is obtained and the the expected absorption is 57% in a nominally 0.5 µm thick layer.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…One possible mechanism noted in the literature [10,6] is the thermal shift of the bandgap leading to a higher absorption coefficient at a given wavelength. Absorption data for LT-GaAs over a wide energy range were measured in [19]. From these data a value of 17000/cm for the absorption coefficient of annealed LT-GaAs at 780 nm is obtained and the the expected absorption is 57% in a nominally 0.5 µm thick layer.…”
Section: Discussionmentioning
confidence: 99%
“…From these data a value of 17000/cm for the absorption coefficient of annealed LT-GaAs at 780 nm is obtained and the the expected absorption is 57% in a nominally 0.5 µm thick layer. The change in absorption is about 70000/cm/eV (linear fit to the data in [19]). Taking a common red-shift of the bandgap of GaAs of 0.3 nm/K, an enhancement of absorption by 4.5% would be expected from this argument.…”
Section: Discussionmentioning
confidence: 99%
“…4 These midgap states are referred to in other literatures as defect states, deep energy level (EL) defects, deep traps, deep defects, and midgap defects. 3,[5][6][7][8] Defects in GaAs grown by molecular beam epitaxy (MBE) occur as a result of low-temperature growth in a range from 180 • C to 300 • C. This is lower than the normal epitaxial growth temperatures at around 580 • C to 600 • C. 9 Particle-induced x-ray (PIXE) analysis revealed that LT-GaAs consists of 1-1.25 at % excess As 10 which has been suggested as the source of the deep EL2-like defect (0.68 eV-0.92 eV). 8,[11][12][13] Several other deep-level defects were noted in experimental studies using electron paramagnetic resonance (EPR), thermally stimulated currents (TSC) spectra, deep level transient spectroscopy (DLTS) characterization, and deep center photoluminescence-excitation (PLE) spectra.…”
Section: Introductionmentioning
confidence: 99%
“…7,[13][14][15][16] Theoretical studies on the presence of these point defects and their role in the creation of deep-level states have been conducted for the bulk and unreconstructed surface of GaAs. 5,6,8,[17][18][19][20][21][22] For example, Li et al considered the ternary complex defect (As Ga V As V Ga ) in bulk GaAs, 5 Esteves et al investigated the isolated As Ga using cluster model for bulk, 6 Schultz explored the deep gallium antisite in bulk, 18 and El-Mellouhi et al studied self-vacancies. 20 Moreover, defects in (001) and (110) facets of surface were studied by Ma et al 17 and Williams et al, 21 respectively.…”
Section: Introductionmentioning
confidence: 99%
“…At low intensity continuous wave (CW) illumination, the absorption in post-growth annealed LT-GaAs is indeed very low, and no quantitative data are present in the literature. 16,17 Last years, we developed vertically integrated LT-GaAs photoconductors working at 800 nm, which take advantage of Fabry-Pérot (FP) resonances to exhibit a high dc responsivity 18 and record performances when used as CW THz emitter 19 or detector. 20 In this structure, a sub-micron-thick LT-GaAs layer is sandwiched between two gold layers which serve at the same time as bias electrodes and optical mirror (see Fig.…”
mentioning
confidence: 99%