2021
DOI: 10.1109/led.2021.3054859
|View full text |Cite
|
Sign up to set email alerts
|

Abnormal Thermal Instability of Al-InSnZnO Thin-Film Transistor by Hydroxyl-Induced Oxygen Vacancy at SiOx/Active Interface

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
3
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
5
1

Relationship

1
5

Authors

Journals

citations
Cited by 7 publications
(3 citation statements)
references
References 21 publications
0
3
0
Order By: Relevance
“…In 2021, Shiah et al [83] found that impurities on the surface of the back channel also need to be removed before adding a passivation layer. They found that C-related impurities, originating from photoresist and remaining at the back channel during lithography, are the main cause of NBS instability in these devices.…”
Section: Interface Engineeringmentioning
confidence: 99%
See 1 more Smart Citation
“…In 2021, Shiah et al [83] found that impurities on the surface of the back channel also need to be removed before adding a passivation layer. They found that C-related impurities, originating from photoresist and remaining at the back channel during lithography, are the main cause of NBS instability in these devices.…”
Section: Interface Engineeringmentioning
confidence: 99%
“…(e) Threshold voltage shift of TFTs with different treatment under NBS. (f) NBS stability and (g) PBS stability of UV ozone treated ITZO TFT[83] . (a)-(g) , © 2021 IEEE.…”
mentioning
confidence: 99%
“…Lots of work have been reported to improve the stability of metal-oxide semiconductor transistors. 28 Pressure sensors using a-IGZO transistors have also been reported. Geng et al fabricated a pressure sensor containing piezoelectric capacitor using a dual-gate a-IGZO TFT.…”
Section: Introductionmentioning
confidence: 99%