2021
DOI: 10.1016/j.actamat.2020.11.019
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Ab initio study of oxygen segregation in silicon grain boundaries: The role of strain and vacancies

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Cited by 17 publications
(41 citation statements)
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“…The formation energy of the vacancy V1 in the GB is E f VGB = 2.91 eV while for the vacancy V2 we found E f VGB = 3.04 eV. [31] The presence of the vacancy induces coordination defects, and in the case of V1 and V2 we have two Si atoms that are threefold coordinated while all the other Si atoms are fourfold coordinated. [10,16,31,[34][35][36] To study the role of C, N and O segregation we then inserted these atoms as interstitials in the Si GB with and without vacancies.…”
Section: Grain Boundary Structuresmentioning
confidence: 80%
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“…The formation energy of the vacancy V1 in the GB is E f VGB = 2.91 eV while for the vacancy V2 we found E f VGB = 3.04 eV. [31] The presence of the vacancy induces coordination defects, and in the case of V1 and V2 we have two Si atoms that are threefold coordinated while all the other Si atoms are fourfold coordinated. [10,16,31,[34][35][36] To study the role of C, N and O segregation we then inserted these atoms as interstitials in the Si GB with and without vacancies.…”
Section: Grain Boundary Structuresmentioning
confidence: 80%
“…These structures, without impurities, present a sharp peak at the bottom of the conduction band which, by the analysis of the projected-DOS (not shown), is due to the threefold coordinated atoms Si1 and Si2. [31] Another peak is also observed at around -0.5 eV in the valence band. This peak is due to four coordinated Si atoms but which undergo structural changes due to the presence of the vacancy in the GB.…”
Section: B Carbon Oxygen and Nitrogen Atoms In σ3{111} Si Gb With Vac...mentioning
confidence: 96%
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