2020
DOI: 10.26434/chemrxiv.11882547.v2
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A Universal Platform for Selective Phase Growth and Precise-Layer Control in MoTe2

Abstract: Minor structural changes in transition metal dichalcogenides can have dramatic effects on their electronic properties. This makes the quest for key parameters that can enable a selective choice between the competing metallic and semiconducting phases in the 2D MoTe<sub>2</sub> system compelling. Herein, we report the optimal conditions at which the choice of the initial seed layer dictates the type of crystal structure of atomically-thin MoTe<sub>2</sub> films grown by chemical vapour d… Show more

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Cited by 1 publication
(3 citation statements)
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“…The precursor films were then converted into 2H-and 1T'-MoTe2 by CVD with the nature of the precursor layer dictating the phase of MoTe2 as described in previously published work. [22] The substrate with precursor layer was placed in the hot zone of a horizontal Lenton tube furnace with the FeTe2 source (30 mg) positioned 7 cm upstream. The dwell temperature of the source and substrate were set at 630 and 650 °C, respectively.…”
Section: Discussionmentioning
confidence: 99%
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“…The precursor films were then converted into 2H-and 1T'-MoTe2 by CVD with the nature of the precursor layer dictating the phase of MoTe2 as described in previously published work. [22] The substrate with precursor layer was placed in the hot zone of a horizontal Lenton tube furnace with the FeTe2 source (30 mg) positioned 7 cm upstream. The dwell temperature of the source and substrate were set at 630 and 650 °C, respectively.…”
Section: Discussionmentioning
confidence: 99%
“…Thin films of the monoclinic 1T'and hexagonal 2H-MoTe2 were prepared in a CVD reactor at 650 o C using FeTe2 precursor as the source of tellurium similar to previous work. [22] According to Raman spectroscopy the resulting products were either single-phased 1T'-MoTe2 or 2H-MoTe2 (Supplementary Fig. S1, Supplementary Table S1A) depending on the seeding layer used.…”
Section: Synthesis and Characterization Of Mote2 Filmsmentioning
confidence: 99%
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